X Ray Scattering Investigations Of Metallic Thin Films PDF Download
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Author | : Andrew P. Warren |
Publisher | : |
Total Pages | : 128 |
Release | : 2013 |
Genre | : |
ISBN | : |
Download X-ray Scattering Investigations of Metallic Thin Films Book in PDF, ePub and Kindle
Nanometric thin films are used widely throughout various industries and for various applications. Metallic thin films, specifically, are relied upon extensively in the microelectronics industry, among others. For example, alloy thin films are being investigated for CMOS applications, tungsten films find uses as contacts and diffusion barriers, and copper is used often as interconnect material. Appropriate metrology methods must therefore be used to characterize the physical properties of these films. X-ray scattering experiments are well suited for the investigation of nano-scaled systems, and are the focus of this doctoral dissertation. Emphasis is placed on (1) phase identification of polycrystalline thin films, (2) the evaluation of the grain size and microstrain of metallic thin films by line profile analysis, and (3) the study of morphological evolution in solid/solid interfaces. To illustrate the continued relevance of x-ray diffraction for phase identification of simple binary alloy systems, Pt-Ru thin films, spanning the compositional range from pure Pt to pure Ru were investigated. In these experiments, a meta-stable extension of the HCP phase is observed in which the steepest change in the electronic work function coincides with a rapid change in the c/a ratio of the HCP phase. For grain size and microstrain analysis, established line profile methods are discussed in terms of Cu and W thin film analysis. Grain sizes obtained by x-ray diffraction are compared to transmission electron microscopy based analyses. Significant discrepancies between x-ray and electron microscopy are attributed to sub-grain misorientations arising from dislocation core spreading at the film/substrate interface. A novel "residual" full width half max parameter is introduced for examining the contribution of strain to x-ray peak broadening. The residual width is subsequently used to propose an empirical method of line profile analysis for thin films on substrates. X-ray reflectivity was used to study the evolution of interface roughness with annealing for a series of Cu thin films that were encapsulated in both SiO2 and Ta/SiO2. While all samples follow similar growth dynamics, notable differences in the roughness evolution with high temperature ex-situ annealing were observed. The annealing resulted in a smoothing of only one interface for the SiO2 encapsulated films, while neither interface of the Ta/SiO2 encapsulated films evolved significantly. The fact that only the upper Cu/SiO2 interface evolves is attributed to mechanical pinning of the lower interface to the rigid substrate. The lack of evolution of the Cu/Ta/SiO2 interface is consistent with the lower diffusivity expected of Cu in a Cu/Ta interface as compared to that in a Cu/SiO2 interface. The smoothing of the upper Cu/SiO2 interface qualitatively follows that expected for capillarity driven surface diffusion but with notable quantitative deviation.
Author | : Mario Birkholz |
Publisher | : John Wiley & Sons |
Total Pages | : 378 |
Release | : 2006-05-12 |
Genre | : Technology & Engineering |
ISBN | : 3527607048 |
Download Thin Film Analysis by X-Ray Scattering Book in PDF, ePub and Kindle
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
Author | : Mario Birkholz |
Publisher | : Wiley-VCH |
Total Pages | : 378 |
Release | : 2005-12-23 |
Genre | : Technology & Engineering |
ISBN | : 9783527310524 |
Download Thin Film Analysis by X-Ray Scattering Book in PDF, ePub and Kindle
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
Author | : Ullrich Pietsch |
Publisher | : Springer Science & Business Media |
Total Pages | : 410 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 1475740506 |
Download High-Resolution X-Ray Scattering Book in PDF, ePub and Kindle
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
Author | : Yoshio Waseda |
Publisher | : Springer |
Total Pages | : 224 |
Release | : 2003-07-01 |
Genre | : Technology & Engineering |
ISBN | : 354046008X |
Download Anomalous X-Ray Scattering for Materials Characterization Book in PDF, ePub and Kindle
The production of multi layered thin films with sufficient reliability is a key technology for device fabrication in micro electronics. In the Co/Cu type multi layers, for example, magnetoresistance has been found as large as 80 % at 4. 2 K and 50 % at room temperature. In addition to such gigantic mag netoresistance, these multi layers indicate anti ferromagnetic and ferromag netic oscillation behavior with an increase in the thickness of the layers of the non magnetic component. These interesting properties of the new synthetic flmctional materials are attributed to their periodic and interracial structures at a microscopic level, although the origin of such peculiar features is not fully understood. Information on the surface structure or the number density of atoms in the near surface region may provide better insight. Amorphous alloys, frequently referred to as metallic glasses, are produced by rapid quenching from the melt. The second generation amorphous alloys, called "bulk amorphous alloys", have been discovered in some Pd based and Zr based alloy systems, with a super cooled liquid region at more than 120 K. In these alloy systems, one can obtain a sample thickness of several centime ters. Growing scientific and technological curiosity about the new amorphous alloys has focused on the fundamental factors, such as the atomic scale struc ture, which are responsible for the thermal stability with certain chemical compositions.
Author | : Gonzalo Santoro |
Publisher | : |
Total Pages | : |
Release | : 2017 |
Genre | : Technology |
ISBN | : |
Download Grazing Incidence Small Angle X-Ray Scattering as a Tool for In- Situ Time-Resolved Studies Book in PDF, ePub and Kindle
With the advent of third-generation synchrotron sources and the development of fast two-dimensional X-ray detectors, X-ray scattering has become an invaluable tool for in-situ time-resolved experiments. In the case of thin films, grazing incidence small angle X-ray scattering (GISAXS) constitutes a powerful technique to extract morphological information not only of the thin film surface but also of buried structures with statistical relevance. Thus, recently in-situ GISAXS experiments with subsecond time resolution have enabled investigating the self-assembly processes during vacuum deposition of metallic and organic thin films as well as the structural changes of polymer and colloidal thin films in the course of wet deposition. Moreover, processing of thin films has also been investigated in-situ employing GISAXS. In this chapter, we review the current trends of time-resolved GISAXS studies. After an introduction to the GISAXS technique, we present exemplary results of metallic and organic thin film preparation, wet deposition of polymer thin films and self-assembly of colloidal thin films, as well as examples of thin film modification in, e.g., microfluidic channels and within working devices. Finally, an overview of the future perspectives in the field is provided.
Author | : M. Bienfait |
Publisher | : |
Total Pages | : 340 |
Release | : 1989 |
Genre | : Neutrons |
ISBN | : |
Download X-ray and Neutron Scattering from Surfaces and Thin Films Book in PDF, ePub and Kindle
Author | : Christian Hermann Frank |
Publisher | : |
Total Pages | : |
Release | : 2014 |
Genre | : Organic thin films |
ISBN | : |
Download Real-time X-ray Scattering Studies on Organic Thin Films Book in PDF, ePub and Kindle
Author | : Vaclav Holy |
Publisher | : Springer |
Total Pages | : 258 |
Release | : 1998-12-11 |
Genre | : Technology & Engineering |
ISBN | : 9783540620297 |
Download High-Resolution X-Ray Scattering from Thin Films and Multilayers Book in PDF, ePub and Kindle
This critical overview presents experimental methods for solving most frequent strucutral problems of mono-crystalline thin films and layered systems: thickness, crystalline state, strain distribution, interface quality and other properties. A unified theoretical approach based on kinematical and dynamical scattering theories describes the experimental methods. This book is a ready-to-hand reference for experimentalists who want to improve their knowledge on modern x-ray methods for thin-film analysis.
Author | : Shriram Ramanathan |
Publisher | : Springer Science & Business Media |
Total Pages | : 344 |
Release | : 2009-12-03 |
Genre | : Technology & Engineering |
ISBN | : 1441906649 |
Download Thin Film Metal-Oxides Book in PDF, ePub and Kindle
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.