Why In Situ Real Time Characterization Of Thin Film Growth Processes PDF Download
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Author | : Orlando Auciello |
Publisher | : John Wiley & Sons |
Total Pages | : 282 |
Release | : 2001 |
Genre | : Science |
ISBN | : 9780471241416 |
Download In Situ Real-Time Characterization of Thin Films Book in PDF, ePub and Kindle
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application
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Total Pages | : |
Release | : 1995 |
Genre | : |
ISBN | : |
Download Why in Situ, Real-time Characterization of Thin Film Growth Processes? Book in PDF, ePub and Kindle
Author | : Gertjan Koster |
Publisher | : Elsevier |
Total Pages | : 295 |
Release | : 2011-10-05 |
Genre | : Technology & Engineering |
ISBN | : 0857094955 |
Download In Situ Characterization of Thin Film Growth Book in PDF, ePub and Kindle
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques
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Total Pages | : 11 |
Release | : 1997 |
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Download Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces Book in PDF, ePub and Kindle
The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.
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Total Pages | : 0 |
Release | : 2000 |
Genre | : |
ISBN | : |
Download In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions Book in PDF, ePub and Kindle
We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.
Author | : Daniel Abou-Ras |
Publisher | : John Wiley & Sons |
Total Pages | : 760 |
Release | : 2016-07-13 |
Genre | : Science |
ISBN | : 3527699015 |
Download Advanced Characterization Techniques for Thin Film Solar Cells Book in PDF, ePub and Kindle
The book focuses on advanced characterization methods for thin-film solar cells that have proven their relevance both for academic and corporate photovoltaic research and development. After an introduction to thin-film photovoltaics, highly experienced experts report on device and materials characterization methods such as electroluminescence analysis, capacitance spectroscopy, and various microscopy methods. In the final part of the book simulation techniques are presented which are used for ab-initio calculations of relevant semiconductors and for device simulations in 1D, 2D and 3D. Building on a proven concept, this new edition also covers thermography, transient optoelectronic methods, and absorption and photocurrent spectroscopy.
Author | : R. Ramesh |
Publisher | : Springer Science & Business Media |
Total Pages | : 250 |
Release | : 2013-11-27 |
Genre | : Technology & Engineering |
ISBN | : 146156185X |
Download Thin Film Ferroelectric Materials and Devices Book in PDF, ePub and Kindle
The past five years have witnessed some dramatic developments in the general area of ferroelectric thin films materials and devices. Ferroelectrics are not new materials by any stretch ofimagination. Indeed, they have been known since the early partofthis century and popular ferroelectric materials such as Barium Titanate have been in use since the second world war. In the late sixties and seventies, a considerable amountofresearch and development effort was made to create a solid state nonvolatile memory using ferroelectrics in a vary simple matrix-addressed scheme. These attempts failed primarily due to problems associated with either the materials ordue to device architectures. The early eighties saw the advent of new materials processing approaches, such as sol-gel processing, that enabled researchers to fabricate sub-micron thin films of ferroelectric materials on a silicon substrate. These pioneering developments signaled the onsetofa revival in the areaofferroelectric thin films, especially ferroelectric nonvolatile memories. Research and development effort in ferroelectric materials and devices has now hit a feverish pitch, Many university laboratories, national laboratories and advanced R&D laboratories oflarge IC manufacturers are deeply involved in the pursuit of ferroelectric device technologies. Many companies worldwide are investing considerable manpower and resources into ferroelectric technologies. Some have already announced products ranging from embedded memories in micro controllers, low density stand-alone memories, microwave circuit elements, andrf identification tags. There is now considerable optimism that ferroelectric devices andproducts will occupy a significant market-share in the new millennium.
Author | : |
Publisher | : |
Total Pages | : 782 |
Release | : 1995 |
Genre | : Power resources |
ISBN | : |
Download Energy Research Abstracts Book in PDF, ePub and Kindle
Author | : Tushar Vrushank Desai |
Publisher | : |
Total Pages | : 419 |
Release | : 2012 |
Genre | : |
ISBN | : |
Download In Situ Real-time Studies of Organic Semiconductor Thin Film Growth Book in PDF, ePub and Kindle
This thesis discusses the thin film deposition of small molecule organic semiconductors. Small molecule organics are attracting significant interest primarily due to their ability to form well ordered thin films at low temperatures with reasonable electronic properties. Potential applications of organic based electronics include thin film transistors, display technologies, flexible integrated circuits and photovoltaics. The growth and morphology of these organic thin films is very sensitive to the nature (chemical and physical) of the underlying substrate. A significant challenge in fabricating organic thin film devices with superior electrical characteristics is that of controlling and more importantly understanding the properties at the interface between the organic semiconducting layer and the underlying substrate. In this thesis, the use of supersonic molecular beams as a means to deposit organic semiconductor thin films is discussed in conjunction with in situ real-time synchrotron scattering and ex situ atomic force microscopy as thin film characterization techniques. This thesis discusses the effects of the incident kinetic energy of the small molecule organic and the nature of dielectric (clean silicon dioxide, SiO2; or SiO2 modified with self-assembled monolayers, SAMs, of varying thickness and chemical functionality; or SiO2 modified with polymers of varying surface energy) on the fundamental thin film processes occurring at the organic semiconductor/substrate interface. These thin film processes include adsorption, nucleation and diffusion, and the filling up of individual monolayers during thin film growth. Experiments have provided significant insight into these fundamental thin film processes. The results indicate that the probability of adsorption is a strong function of the incident kinetic energy of the organic molecule and thickness of the underlying SAM. The submonolayer island shape and island density is also a strong function of the underlying substrate with the later implying a change in the diffusivity of the organic with the identity of the substrate. Finally, the results suggest that multilayer thin film morphology such as feature/grain size and the thin film roughness is also a function of the underlying substrate.
Author | : |
Publisher | : |
Total Pages | : 426 |
Release | : 1995 |
Genre | : Aeronautics |
ISBN | : |
Download Scientific and Technical Aerospace Reports Book in PDF, ePub and Kindle