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Theory and Application of Laser Chemical Vapor Deposition

Theory and Application of Laser Chemical Vapor Deposition
Author: J. Mazumder
Publisher: Springer Science & Business Media
Total Pages: 406
Release: 2013-06-29
Genre: Technology & Engineering
ISBN: 1489914307

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In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.


Chemical Vapor Deposition

Chemical Vapor Deposition
Author: M. L. Hitchman
Publisher: Academic Press
Total Pages: 692
Release: 1993-04-13
Genre: Science
ISBN:

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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.


Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition
Author: Hugh O. Pierson
Publisher: William Andrew
Total Pages: 458
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 1437744885

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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.


Chemical Vapor Deposition

Chemical Vapor Deposition
Author: S Neralla
Publisher: BoD – Books on Demand
Total Pages: 292
Release: 2016-08-31
Genre: Science
ISBN: 9535125729

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This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.


Chemical Vapor Deposition

Chemical Vapor Deposition
Author: Jong-Hee Park
Publisher: ASM International
Total Pages: 477
Release: 2001
Genre: Technology & Engineering
ISBN: 161503224X

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Theoretical Study of Laser-Stimulated Chemical Vapor Deposition Processes of Importance in Microelectronics

Theoretical Study of Laser-Stimulated Chemical Vapor Deposition Processes of Importance in Microelectronics
Author: T. F. George
Publisher:
Total Pages: 36
Release: 1983
Genre:
ISBN:

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Recent experiments have demonstrated that laser radiation incident on a gas surface interface can stimulate and control the process of vapor deposition onto the surface. This research project has been a theoretical analysis of the deposition and related laser-stimulated processes, with special attention given to the microscopic dynamics of energy flow associated with such processes. (Author).


Catalytic Chemical Vapor Deposition

Catalytic Chemical Vapor Deposition
Author: Hideki Matsumura
Publisher: John Wiley & Sons
Total Pages: 560
Release: 2019-02-08
Genre: Technology & Engineering
ISBN: 3527818669

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The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.


Principles of Chemical Vapor Deposition

Principles of Chemical Vapor Deposition
Author: Daniel Dobkin
Publisher: Springer Science & Business Media
Total Pages: 298
Release: 2003-04-30
Genre: Technology & Engineering
ISBN: 9781402012488

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Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.