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The Physics and Technology of Ion Sources

The Physics and Technology of Ion Sources
Author: Ian G. Brown
Publisher: Wiley-VCH
Total Pages: 472
Release: 1989-04-18
Genre: Science
ISBN:

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The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.


The Physics and Technology of Ion Sources

The Physics and Technology of Ion Sources
Author: Ian G. Brown
Publisher: John Wiley & Sons
Total Pages: 396
Release: 2006-03-06
Genre: Science
ISBN: 3527604545

Download The Physics and Technology of Ion Sources Book in PDF, ePub and Kindle

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.


Industrial Ion Sources

Industrial Ion Sources
Author: Viacheslav V. Zhurin
Publisher: John Wiley & Sons
Total Pages: 326
Release: 2012-09-19
Genre: Science
ISBN: 3527635742

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Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.


High Resolution Focused Ion Beams: FIB and its Applications

High Resolution Focused Ion Beams: FIB and its Applications
Author: Jon Orloff
Publisher: Springer Science & Business Media
Total Pages: 304
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 1461507650

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In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.


Electron Cyclotron Resonance Ion Sources and ECR Plasmas

Electron Cyclotron Resonance Ion Sources and ECR Plasmas
Author: R Geller
Publisher: CRC Press
Total Pages: 456
Release: 1996-01-01
Genre: Science
ISBN: 9780750301077

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Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.


Ion Sources

Ion Sources
Author: Huashun Zhang
Publisher: Springer
Total Pages: 0
Release: 1999-11-08
Genre: Science
ISBN: 9783540657477

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While dealing with the design and operation of ion sources, this book additionally discusses the physics of ion formation of the various elements with different charge states and charge neutralization. Ion selection and beam diagnostics are equally included, and the presentation of the necessary equations and diagrams for the various parameters makes this a useful handbook for ion sources.


Ion Implantation Science and Technology

Ion Implantation Science and Technology
Author: J.F. Ziegler
Publisher: Elsevier
Total Pages: 649
Release: 2012-12-02
Genre: Science
ISBN: 0323144012

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Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.


Development and Applications of Negative Ion Sources

Development and Applications of Negative Ion Sources
Author: Vadim Dudnikov
Publisher: Springer Nature
Total Pages: 346
Release: 2019-10-18
Genre: Science
ISBN: 3030284379

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This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.


Ion Sources

Ion Sources
Author: Huashun Zhang
Publisher: Springer
Total Pages: 476
Release: 2010-12-03
Genre: Science
ISBN: 9783642085024

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While dealing with the design and operation of ion sources, this book additionally discusses the physics of ion formation of the various elements with different charge states and charge neutralization. Ion selection and beam diagnostics are equally included, and the presentation of the necessary equations and diagrams for the various parameters makes this a useful handbook for ion sources.


Plasma Technology

Plasma Technology
Author: M. Capitelli
Publisher: Springer Science & Business Media
Total Pages: 226
Release: 2012-12-06
Genre: Science
ISBN: 1461534003

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The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A