Semiconductor Materials Analysis and Fabrication Processcontrol
Author | : R. Stuck |
Publisher | : |
Total Pages | : 338 |
Release | : 1993 |
Genre | : |
ISBN | : |
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Author | : R. Stuck |
Publisher | : |
Total Pages | : 338 |
Release | : 1993 |
Genre | : |
ISBN | : |
Author | : G.M. Crean |
Publisher | : Elsevier |
Total Pages | : 352 |
Release | : 2012-12-02 |
Genre | : Science |
ISBN | : 0444596917 |
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Author | : G. M. Crean |
Publisher | : North Holland |
Total Pages | : 338 |
Release | : 1993-01-01 |
Genre | : Ellipsometry |
ISBN | : 9780444899088 |
Reviews current research in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Contributions discuss the emergence and evaluation of in situ optical diagnostic techniques, such as photoreflectance and spectroellipsometry.
Author | : G. M. Crean |
Publisher | : |
Total Pages | : 338 |
Release | : 1993 |
Genre | : |
ISBN | : |
Author | : G. M. Crean |
Publisher | : |
Total Pages | : |
Release | : 1993 |
Genre | : |
ISBN | : |
Author | : G. M Crean |
Publisher | : |
Total Pages | : |
Release | : 1993 |
Genre | : |
ISBN | : |
Author | : Gary S. May |
Publisher | : John Wiley & Sons |
Total Pages | : 428 |
Release | : 2006-05-26 |
Genre | : Technology & Engineering |
ISBN | : 0471790273 |
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author | : Stanley Middleman |
Publisher | : McGraw-Hill Companies |
Total Pages | : 802 |
Release | : 1993 |
Genre | : Technology & Engineering |
ISBN | : |
Written primarily for chemical engineering students, the material included in this new text is an extension of upper level chemical engineering courses. Covering a range of processes in semiconductor device fabrication, the authors try to present traditional chemical engineering methodology in a non-traditional context. The text covers such topics as crystal growth and filtration and contains over 300 worked examples and problems.
Author | : United States. National Bureau of Standards |
Publisher | : |
Total Pages | : 44 |
Release | : 1968-10 |
Genre | : Semiconductors |
ISBN | : |
Author | : James Moyne |
Publisher | : CRC Press |
Total Pages | : 368 |
Release | : 2018-10-08 |
Genre | : Technology & Engineering |
ISBN | : 1420040669 |
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.