Proceedings Of The Symposium On High Speed Iii V Electronics For Wireless Applications And The Twenty Fifth State Of The Art Program On Compound Semiconductors Sotapocs Xxv PDF Download
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Author | : F. Ren |
Publisher | : The Electrochemical Society |
Total Pages | : 364 |
Release | : 1996 |
Genre | : Science |
ISBN | : 9781566771658 |
Download Proceedings of the Symposium on High Speed III-V Electronics for Wireless Applications and the Twenty-Fifth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXV) Book in PDF, ePub and Kindle
Author | : British Library. Document Supply Centre |
Publisher | : |
Total Pages | : 938 |
Release | : 1997 |
Genre | : Conference proceedings |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 990 |
Release | : 1999 |
Genre | : American literature |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 2304 |
Release | : 1997 |
Genre | : Electrical engineering |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 422 |
Release | : 1997 |
Genre | : Engineering |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 554 |
Release | : 1998 |
Genre | : Compound semiconductors |
ISBN | : |
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Author | : Electrochemical Society. Meeting |
Publisher | : The Electrochemical Society |
Total Pages | : 538 |
Release | : 2003 |
Genre | : Science |
ISBN | : 9781566773751 |
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Author | : Francis F. Chen |
Publisher | : Springer Science & Business Media |
Total Pages | : 213 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 1461501814 |
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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author | : Markus-Christian Amann |
Publisher | : Artech House Optoelectronics L |
Total Pages | : 0 |
Release | : 1998 |
Genre | : Technology & Engineering |
ISBN | : 9780890069639 |
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This comprehensive reference discusses the underlying physics, operational principles, and performance and applications of tunable laser diodes. The book is supplemented with practical examples and helpful notations.
Author | : Howard R. Huff |
Publisher | : The Electrochemical Society |
Total Pages | : 650 |
Release | : 2002 |
Genre | : Science |
ISBN | : 9781566773744 |
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