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The Physics and Technology of Ion Sources

The Physics and Technology of Ion Sources
Author: Ian G. Brown
Publisher: Wiley-VCH
Total Pages: 472
Release: 1989-04-18
Genre: Science
ISBN:

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The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.


The Physics and Technology of Ion Sources

The Physics and Technology of Ion Sources
Author: Ian G. Brown
Publisher: John Wiley & Sons
Total Pages: 396
Release: 2006-03-06
Genre: Science
ISBN: 3527604545

Download The Physics and Technology of Ion Sources Book in PDF, ePub and Kindle

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.


Physics and Technology of Plasma Ion Sources

Physics and Technology of Plasma Ion Sources
Author: M. D. Gabovich
Publisher:
Total Pages: 334
Release: 1973
Genre:
ISBN:

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;Contents: Brief information on certain elemental processes occurring in plasma ion sources; Plasma ion sources (basic physical processes, designs, properties, and parameters); The mass spectrum and charge composition of beams extracted from plasma ion sources; Plasma sources of ions of refractory metals; Extraction of ions and the primary formation of ion beams. Beam propagation and a study of beams; Penetration of a plasma from an ion source into a vacuum. Energy of the ions leaving the source plasma; The vibrational properties of a plasma and their influence on the processes in plasma ion sources and neutralized ion beams.


Plasma Technology

Plasma Technology
Author: M. Capitelli
Publisher: Springer Science & Business Media
Total Pages: 226
Release: 2012-12-06
Genre: Science
ISBN: 1461534003

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The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A


Development and Applications of Negative Ion Sources

Development and Applications of Negative Ion Sources
Author: Vadim Dudnikov
Publisher: Springer Nature
Total Pages: 498
Release: 2023-06-22
Genre: Science
ISBN: 3031284089

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This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.


Electron Cyclotron Resonance Ion Sources and ECR Plasmas

Electron Cyclotron Resonance Ion Sources and ECR Plasmas
Author: R Geller
Publisher: Routledge
Total Pages: 351
Release: 2018-12-13
Genre: Science
ISBN: 135145322X

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Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour


Electron Cyclotron Resonance Ion Sources and ECR Plasmas

Electron Cyclotron Resonance Ion Sources and ECR Plasmas
Author: R Geller
Publisher: CRC Press
Total Pages: 456
Release: 1996-01-01
Genre: Science
ISBN: 9780750301077

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Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.


Compact Plasma and Focused Ion Beams

Compact Plasma and Focused Ion Beams
Author: Sudeep Bhattacharjee
Publisher: Taylor & Francis
Total Pages: 394
Release: 2013-12-12
Genre: Science
ISBN: 1466557885

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Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.


Industrial Ion Sources

Industrial Ion Sources
Author: Viacheslav V. Zhurin
Publisher: John Wiley & Sons
Total Pages: 326
Release: 2012-09-19
Genre: Science
ISBN: 3527635742

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Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.


Plasma Cathode Electron Sources

Plasma Cathode Electron Sources
Author: Efim Oks
Publisher: John Wiley & Sons
Total Pages: 181
Release: 2007-06-27
Genre: Science
ISBN: 3527609245

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This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.