Photochemical Vapor Deposition (Science and Technology Brief).
Author | : |
Publisher | : |
Total Pages | : 0 |
Release | : 1988 |
Genre | : |
ISBN | : |
Download Photochemical Vapor Deposition (Science and Technology Brief). Book in PDF, ePub and Kindle
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Photochemical Vapor Deposition PDF full book. Access full book title Photochemical Vapor Deposition.
Author | : |
Publisher | : |
Total Pages | : 0 |
Release | : 1988 |
Genre | : |
ISBN | : |
Author | : Jihyo Rhieu |
Publisher | : |
Total Pages | : 240 |
Release | : 1997 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Jong-Hee Park |
Publisher | : ASM International |
Total Pages | : 477 |
Release | : 2001 |
Genre | : Technology & Engineering |
ISBN | : 161503224X |
Author | : Burt Wayne Fowler |
Publisher | : |
Total Pages | : 246 |
Release | : 1990 |
Genre | : Photochemistry |
ISBN | : |
Author | : Y. Pauleau |
Publisher | : Springer Science & Business Media |
Total Pages | : 372 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 940100353X |
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author | : M. L. Hitchman |
Publisher | : Academic Press |
Total Pages | : 692 |
Release | : 1993-04-13 |
Genre | : Science |
ISBN | : |
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author | : S Neralla |
Publisher | : BoD – Books on Demand |
Total Pages | : 292 |
Release | : 2016-08-31 |
Genre | : Science |
ISBN | : 9535125729 |
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author | : Hirotsugu Yasuda |
Publisher | : CRC Press |
Total Pages | : 256 |
Release | : 2011-04-04 |
Genre | : Science |
ISBN | : 1439838801 |
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for a
Author | : Eden JG. |
Publisher | : |
Total Pages | : |
Release | : 1992 |
Genre | : |
ISBN | : |
Author | : J. G. Eden |
Publisher | : Wiley-Interscience |
Total Pages | : 216 |
Release | : 1992-10-07 |
Genre | : Science |
ISBN | : |
Remote Sensing by Fourier Transform Spectrometry Reinhard Beer Here is a complete introduction to the specification, design, and implementation of Fourier Transform Spectrometers especially intended for atmospheric or astronomical remote sensing. Dr. Beer, one of the pioneers in this field, provides both specific and general information on the development of requirements for remote sensing Fourier transform infrared spectrometers and discusses many of the problems and pitfalls (along with their avoidance and solutions) that can beset the new user. 1992 (0 471-55346-8) 176 pp. Principles and Practice of Spectroscopic Calibration Howard Mark Clearly linking theory with applications, this unique guide to spectroscopic calibration advances an approach that is understandable, free of the usual uncertainties, and simple to execute. The book details the practical aspects of generating a calibration equation, as well as the basics of recognizing and dealing with different types of problems affecting calibration. Most of the procedures are applicable to such sophisticated and popular approaches as Principal Component Calibration, Partial Least Squares Calibration, and Fourier Transform Calibration. 1991 (0 471-54614-3) 192 pp. Activation Spectrometry in Chemical Analysis Susan J. Parry Knowing the specifics of activation analysis has become essential for a wide range of specialists, including chemists, physicists, and biologists, who need to know how to make the most effective use of this technique. In clear, easy-to-read language, this book provides a straightforward review of just what activation analysis can do, describing the technique as it is currently applied to analytical problems. With emphasis on activation spectrometry, Dr. Parry outlines the specifics of the procedure, which, along with other activation analysis methods, have proven critical to the technique’s success. 1991 (0 471-63844-7) 264 pp.