Molecular Beam Epitaxial Growth Of Complex Novel Oxides PDF Download

Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Molecular Beam Epitaxial Growth Of Complex Novel Oxides PDF full book. Access full book title Molecular Beam Epitaxial Growth Of Complex Novel Oxides.

Epitaxial Growth of Complex Metal Oxides

Epitaxial Growth of Complex Metal Oxides
Author: Gertjan Koster
Publisher: Woodhead Publishing
Total Pages: 534
Release: 2022-04-22
Genre: Science
ISBN: 0081029462

Download Epitaxial Growth of Complex Metal Oxides Book in PDF, ePub and Kindle

Epitaxial Growth of Complex Metal Oxides, Second Edition reviews techniques and recent developments in the fabrication quality of complex metal oxides, which are facilitating advances in electronic, magnetic and optical applications. Sections review the key techniques involved in the epitaxial growth of complex metal oxides and explore the effects of strain and stoichiometry on crystal structure and related properties in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films, including optoelectronics, batteries, spintronics and neuromorphic applications. This new edition has been fully updated, with brand new chapters on topics such as atomic layer deposition, interfaces, STEM-EELs, and the epitaxial growth of multiferroics, ferroelectrics and nanocomposites. Examines the techniques used in epitaxial thin film growth for complex oxides, including atomic layer deposition, sputtering techniques, molecular beam epitaxy, and chemical solution deposition techniques Reviews materials design strategies and materials property analysis methods, including the impacts of defects, strain, interfaces and stoichiometry Describes key applications of epitaxially grown metal oxides, including optoelectronics, batteries, spintronics and neuromorphic applications


Molecular Beam Epitaxy

Molecular Beam Epitaxy
Author: Mohamed Henini
Publisher: Elsevier
Total Pages: 788
Release: 2018-06-27
Genre: Science
ISBN: 0128121378

Download Molecular Beam Epitaxy Book in PDF, ePub and Kindle

Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and ‘how to’ on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. Condenses the fundamental science of MBE into a modern reference, speeding up literature review Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community


Perspective

Perspective
Author:
Publisher:
Total Pages: 5
Release: 2016
Genre:
ISBN:

Download Perspective Book in PDF, ePub and Kindle

In this study, the molecular beam epitaxy(MBE) technique is well known for producing atomically smooth thin films as well as impeccable interfaces in multilayers of many different materials. In particular, molecular beam epitaxy is well suited to the growth of complex oxides, materials that hold promise for many applications. Rapid synthesis and high throughput characterization techniques are needed to tap into that potential most efficiently. We discuss our approach to doing that, leaving behind the traditional one-growth-one-compound scheme and instead implementing combinatorial oxide molecular beam epitaxy in a custom built system.


Epitaxial Growth, Characterization and Application of Novel Wide Bandgap Oxide Semiconductors

Epitaxial Growth, Characterization and Application of Novel Wide Bandgap Oxide Semiconductors
Author: Jeremy West Mares
Publisher:
Total Pages: 136
Release: 2010
Genre: Molecular beam epitaxy
ISBN:

Download Epitaxial Growth, Characterization and Application of Novel Wide Bandgap Oxide Semiconductors Book in PDF, ePub and Kindle

In this work, a body of knowledge is presented which pertains to the growth, characterization and exploitation of high quality, novel II-IV oxide epitaxial films and structures grown by plasma-assisted molecular beam epitaxy. The two compounds of primary interest within this research are the ternary films Ni[subscript x]Mg1[subscript x]O and Zn[subscript x]Mg1[subscript x]0 and the investigation focuses predominantly on the realization, assessment and implementation of these two oxides as optoelectronic materials. The functioning hypothesis for this largely experimental effort has been that these cubic ternary oxides can be exploited--and possibly even juxtaposed--to realize novel wide band gap optoelectronic technologies. The results of the research conducted presented herein overwhelmingly support this hypothesis in that they confirm the possibility to grow these films with sufficient quality by this technique, as conjectured. Ni[subscript x]Mg1−[subscript x]O films with varying Nickel concentrations ranging from x = 0 to x = 1 have been grown on lattice matched MgO substrates (lattice mismatch [epsilon][less than]0.01) and characterized structurally, morphologically, optically and electrically. Similarly, cubic Zn[subscript x]Mg1−[subscript x]0 films with Zinc concentrations ranging from x = 0 to x[almost equal to]0.53, as limited by phase segregation, have also been grown and characterized. Photoconductive devices have been designed and fabricated from these films and characterized. Successfully engineered films in both categories exhibit the desired deep ultraviolet photoresponse and therefore verify the hypothesis. While the culminating work of interest here focuses on the two compounds discussed above, the investigation has also involved the characterization or exploitation of related films including hexagonal phase Zn[subscript x]Mg1−[subscript x]O, ZnO, Cd[subscript x]Zn1−[subscript x]O and hybrid structures based on these compounds used in conjunction with GaN. These works were critical precursors to the growth of cubic oxides, however, and are closely relevant. Viewed in its entirety, this document can therefore be considered a multifaceted interrogation of several novel oxide compounds and structures, both cubic and wurtzite in structure. The conclusions of the research can be stated succinctly as a quantifiably successful effort to validate the use of these compounds and structures for wide bandgap optoelectronic technologies.


High Quality Molecular Beam Epitaxy Growth and Characterization of Lead Titanate Zirconate Based Complex-oxides

High Quality Molecular Beam Epitaxy Growth and Characterization of Lead Titanate Zirconate Based Complex-oxides
Author: Xing Gu
Publisher:
Total Pages:
Release: 2008
Genre: Epitaxy
ISBN:

Download High Quality Molecular Beam Epitaxy Growth and Characterization of Lead Titanate Zirconate Based Complex-oxides Book in PDF, ePub and Kindle

Research interest in complex oxides has resurged owing to progress in modern epitaxial techniques. Among such oxides, lead-titanate-based thin films such as PbTiO3 (PTO) and Pb(ZrxTi1?x)O3 (PZT) offer attractive advantages for a wide variety of applications. Moreover, integration between functional oxides with compound semiconductors has the potential to realize multi-functional devices which enjoy the properties from both groups of materials. Ferroelectric materials with a perovskite structure (ABO3) and semiconductors such as GaN with a hexagonal structure, require a careful choice of a bridge layer and suitable epitaxial technique. Molecular beam epitaxy (MBE) has been an established technique in providing epitaxial growth with high crystal perfection and precise control over material composition. Single-crystal oxides grown by molecular beam epitaxy (MBE) can in principle avoid grain boundaries and provide a sharp interface as well. In this dissertation, the MBE growth mechanism of PZT was investigated. In-situ RHEED patterns indicate that the growth of PTO and PZT occur in a two-dimensional, layer by layer mode, as confirmed by a streaky pattern. The crystal quality of PTO, PZO, and PZT thin films prepared by MBE are evaluated by X-ray diffraction (XRD), and have a full width at half maximum (FWHM) value of 4 arcmin for an 80nm thick layer. Optical properties of the PTO thin films have been characterized by variable angle spectroscopic ellipsometry (VASE), and well resolved dielectric functions are extracted. The refractive index is determined as 2.605 at 633 nm, and bandgap energy as 3.778eV. The electrical properties of the PTO and PZT are evaluated by the measurement of polarization-field hysteresis loops, give a remanent polarization of 83 [mu]C/cm2 and a coercive field of 77 kV/cm. Lead oxide (PbO), titanium dioxide (TiO2), and zirconium dioxide (ZrO2), on GaN templates for potential PZT/GaN integration. The epitaxial growth of TiO2, PbO, and ZrO2 is realized on GaN templates for the first time by MBE. The PbO epitaxial layer was also used as a nucleation layer to enable single crystalline, perovskite PTO growth on GaN.


Molecular Beam Epitaxy

Molecular Beam Epitaxy
Author: Robin F.C. Farrow
Publisher: Elsevier
Total Pages: 795
Release: 1995-12-31
Genre: Technology & Engineering
ISBN: 0815518404

Download Molecular Beam Epitaxy Book in PDF, ePub and Kindle

In this volume, the editor and contributors describe the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize growth and characterization of GaAs-based structures. The aim in this book is somewhat different; it is to demonstrate the versatility of the technique by showing how it can be utilized to prepare and explore a range of distinct and diverse materials. For each of these materials systems MBE has played a key role both in their development and application to devices.