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Epitaxial Growth of Complex Metal Oxides

Epitaxial Growth of Complex Metal Oxides
Author: Gertjan Koster
Publisher: Woodhead Publishing
Total Pages: 534
Release: 2022-04-22
Genre: Science
ISBN: 0081029462

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Epitaxial Growth of Complex Metal Oxides, Second Edition reviews techniques and recent developments in the fabrication quality of complex metal oxides, which are facilitating advances in electronic, magnetic and optical applications. Sections review the key techniques involved in the epitaxial growth of complex metal oxides and explore the effects of strain and stoichiometry on crystal structure and related properties in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films, including optoelectronics, batteries, spintronics and neuromorphic applications. This new edition has been fully updated, with brand new chapters on topics such as atomic layer deposition, interfaces, STEM-EELs, and the epitaxial growth of multiferroics, ferroelectrics and nanocomposites. Examines the techniques used in epitaxial thin film growth for complex oxides, including atomic layer deposition, sputtering techniques, molecular beam epitaxy, and chemical solution deposition techniques Reviews materials design strategies and materials property analysis methods, including the impacts of defects, strain, interfaces and stoichiometry Describes key applications of epitaxially grown metal oxides, including optoelectronics, batteries, spintronics and neuromorphic applications


Epitaxial Growth Mechanisms in Vacuum Deposited Thin Films

Epitaxial Growth Mechanisms in Vacuum Deposited Thin Films
Author: R. J. Gerdes
Publisher:
Total Pages: 14
Release: 1969
Genre: Crystal growth
ISBN:

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The mechanisms which lead to oriented overgrowth have been investigated with a view towards experimental and theoretical development of suitable models for nucleation and growth phenomena. Particular emphasis was placed on the role of common epitaxial features occurring independently of experimental conditions. Such features included the parallel alignment of close-packed rows of deposit atoms with 110 directions in the substrate, long-range epitaxial effects and crystallite size distributions characteristic of the various growth stages. (Author).


Morphological Organization in Epitaxial Growth and Removal

Morphological Organization in Epitaxial Growth and Removal
Author: Zhenyu Zhang
Publisher: World Scientific
Total Pages: 516
Release: 1998
Genre: Science
ISBN: 9789810234713

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This book provides a critical assessment of the current status and the likely future directions of thin-film growth, an area of exceptional technological importance. Its emphasis is on descriptions of the atomic-scale mechanisms controlling the dynamics and thermodynamics of the morphological evolution of the growth front of thin films in diverse systems of fundamental and technological significance. The book covers most of the original and important conceptual developments made in the 1990s. The articles, written by leading experts, are arranged in five major categories ? the theoretical basis, semiconductor-on-semiconductor growth, metal-on-metal growth, metal-on-semiconductor growth, and removal as the inverse process of growth. This book, the only one of its kind in this decade, will prove to be an indispensable reference source for active researchers, those having peripheral interest, and graduate students starting out in the field.


Strategies to Realize Never-before-synthesized Epitaxial Films

Strategies to Realize Never-before-synthesized Epitaxial Films
Author: Matthew R. Barone
Publisher:
Total Pages: 0
Release: 2022
Genre:
ISBN:

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Despite practical difficulty, epitaxial growth of phases with increasingly complex crystal structures has enabled advances in both condensed matter physics and in commercial applications. This progress has been enabled by creativity and systematic investigation to improve synthesis science. The hard work of my predecessors has exposed previously inaccessible material properties and brought materials previously reserved for university research to industrial production lines. In this thesis, I present my contributions to synthesis science by developing new strategies and techniques to realize first-of-their-kind oxide thin films using molecular-beam epitaxy.The first half of my thesis focuses on the synthesis science of Ruddlesden-Popper titanates with formula (ATiO3)nAO. I present my work to precisely control the interlayer distance in these layered Ruddlesden-Popper titanates (as well as other layered thin films) by developing an ex situ x-ray diffraction technique to quantitatively compute source fluxes and correct Ruddlsden-Popper synthesis recipes. The power of this technique is demonstrated by synthesis of a (ATiO3)20AO with 60% barium on the A-site. Subsequently, I elaborate on the novel in situ reflection high energy electron diffraction technique that I use to calibrate and guide growth of (ATiO3)20AO films and systematically study the influence of substrate temperature, epitaxial strain, and barium content on the crystal quality of the thin films. This thorough synthetic investigation provides a detailed roadmap for the future of research on these previously inaccessible phases. In the second half of my thesis, I focus on one of the greatest problems plaguing oxide electronics: the absence of a practical p-type conducting oxide. Through my work, I demonstrate the first epitaxial growth of a promising new p-type oxide candidate, Ta2SnO6. While I successfully synthesized the first ever epitaxial thin film of Ta2SnO6, I ultimately deduce that the generation of holes is compensated by the spontaneous formation of oxygen vacancies at MBE-compatible growth conditions. Although our doping attempts were unsuccessful, computations indicate that hole doping is possible within a range of synthetic conditions, encouraging further study by alternative techniques. I perform a thorough structural analysis of the first-ever epitaxial Ta2SnO6 films and enable the first measurement of the 2.4 eV bandgap of the candidate p-type oxide. This work on epitaxy of Ta2SnO6 provided the insight that enabled the first ever epitaxial synthesis of (110)-oriented SnO, an immense synthetic achievement as it is the first ever epitaxial synthesis of any 2D van der Waals crystal with the layers vertically aligned.


Process for Depositing Epitaxial Alkaline Earth Oxide Onto a Substrate and Structures Prepared with the Process

Process for Depositing Epitaxial Alkaline Earth Oxide Onto a Substrate and Structures Prepared with the Process
Author:
Publisher:
Total Pages:
Release: 1996
Genre:
ISBN:

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A process and structure involving a silicon substrate utilize molecular beam epitaxy (MBE) and/or electron beam evaporation methods and an ultra-high vacuum facility to grow a layup of epitaxial alkaline earth oxide films upon the substrate surface. By selecting metal constituents for the oxides and in the appropriate proportions so that the lattice parameter of each oxide grown closely approximates that of the substrate or base layer upon which oxide is grown, lattice strain at the film/film or film/substrate interface of adjacent films is appreciably reduced or relieved. Moreover, by selecting constituents for the oxides so that the lattice parameters of the materials of adjacent oxide films either increase or decrease in size from one parameter to another parameter, a graded layup of films can be grown (with reduced strain levels therebetween) so that the outer film has a lattice parameter which closely approximates that of, and thus accomodates the epitaxial growth of, a pervoskite chosen to be grown upon the outer film.