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Ion Implantation Science and Technology

Ion Implantation Science and Technology
Author: J.F. Ziegler
Publisher: Elsevier
Total Pages: 649
Release: 2012-12-02
Genre: Science
ISBN: 0323144012

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Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.


Ion Implantation

Ion Implantation
Author: James F. Ziegler
Publisher:
Total Pages:
Release: 2004
Genre:
ISBN:

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Ion Implantation

Ion Implantation
Author: Ion Implantation Technology, Incorporated
Publisher:
Total Pages: 687
Release: 2000-01-01
Genre:
ISBN: 9780965420723

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Ion Implantation and Synthesis of Materials

Ion Implantation and Synthesis of Materials
Author: Michael Nastasi
Publisher: Springer Science & Business Media
Total Pages: 271
Release: 2007-05-16
Genre: Science
ISBN: 3540452982

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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.


Ion Implantation: Basics to Device Fabrication

Ion Implantation: Basics to Device Fabrication
Author: Emanuele Rimini
Publisher: Springer Science & Business Media
Total Pages: 400
Release: 2013-11-27
Genre: Technology & Engineering
ISBN: 1461522595

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Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.


Ion Implantation Technology

Ion Implantation Technology
Author: Edmund G. Seebauer
Publisher: American Institute of Physics
Total Pages: 582
Release: 2008-12-11
Genre: Technology & Engineering
ISBN: 9780735405974

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The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).


Ion Implantation Technology - 94

Ion Implantation Technology - 94
Author: S. Coffa
Publisher: Newnes
Total Pages: 1031
Release: 1995-05-16
Genre: Science
ISBN: 044459972X

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The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.


Ion Implantation 1988

Ion Implantation 1988
Author:
Publisher:
Total Pages: 472
Release: 1988
Genre:
ISBN:

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The volume presents 24 invited contributions.


Ion Implantation

Ion Implantation
Author: Ishaq Ahmad
Publisher: BoD – Books on Demand
Total Pages: 154
Release: 2017-06-14
Genre: Science
ISBN: 9535132377

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Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.


Ion Implantation

Ion Implantation
Author: A. D. Pogrebnjak
Publisher: Nova Science Publishers
Total Pages: 0
Release: 2018-09
Genre:
ISBN: 9781536139624

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New results in the field of ion implantation from the experienced scientists from different countries are presented in this book. Influence of ion implantation on structure and properties of semi-conducting materials, instrumental steels and alloys, nanocomposite coatings, including multielement ones, titanium alloys with the shape memory effect and super-elasticity are discussed in detail within this book. New data on novel applications of ion implantation for the modification and testing (radiation hardness simulation) of memristive devices, as well as application of ion implantation of group V dopants in the MCT epilayer are presented in this book. Potential use of ion implantation for the synthesis of Ag nanoparticles in a thin Si layer for the development of thin-film solar cells fabrication technology is discussed. The effect of ion implantation on the physical and mechanical properties of the hard alloy plates based on tungsten carbide and a cobalt binder is described. A study of the effects of ion implantation on the phase composition and the structure of materials is presented; the development of displacement cascades during ion implantation and their influence on the formation of the structure of the processed materials are shown. The role of defects in the formation of the phase composition of the ion-implanted materials, as well as the structural-phase transformations in metals after ion implantation is investigated. This book will be interesting for professionals in the study of solid state physics, nuclear physics, physics of semi-conductors and nanomaterials. It can also be useful for masters and PhD students, as well as for professionals researching the fabrication and investigation of protective materials with enhanced physical-mechanical and tribological properties, good biocompatibility and resistance to irradiation.