Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download In Situ Transmission Electron Microscopy Studies On Advanced Materials For Micro And Nanoelectronics PDF full book. Access full book title In Situ Transmission Electron Microscopy Studies On Advanced Materials For Micro And Nanoelectronics.
| Author | : Zhongquan Liao |
| Publisher | : |
| Total Pages | : |
| Release | : 2017 |
| Genre | : |
| ISBN | : |
| Author | : Litao Sun |
| Publisher | : Springer Nature |
| Total Pages | : 378 |
| Release | : 2023-03-11 |
| Genre | : Technology & Engineering |
| ISBN | : 9811968454 |
This book focuses on in-situ transmission electron microscopy (TEM), an investigatory technique used to observe a sample’s response to a given stimulus (including electron irradiation, thermal excitation, mechanical force, optical excitation, electric and magnetic fields) at the nanoscale in real time. The book introduces readers to the technical strategy behind the in-situ technique and its developments. It reviews the research frontiers of using in-situ TEM in energy conversion and storage, catalysis, nanomaterials synthesis, nanoelectronics, etc. Furthermore, it discusses the future prospects for in-situ TEM. The book offers a valuable guide for all undergraduate and graduate students who are interested in TEM characterization technology. It also serves as a reference source on cutting-edge in-situ techniques for researchers and engineers.
| Author | : Alain Claverie |
| Publisher | : John Wiley & Sons |
| Total Pages | : 280 |
| Release | : 2013-01-29 |
| Genre | : Technology & Engineering |
| ISBN | : 1118579054 |
Today, the availability of bright and highly coherent electron sources and sensitive detectors has radically changed the type and quality of the information which can be obtained by transmission electron microscopy (TEM). TEMs are now present in large numbers not only in academia, but also in industrial research centers and fabs. This book presents in a simple and practical way the new quantitative techniques based on TEM which have recently been invented or developed to address most of the main challenging issues scientists and process engineers have to face to develop or optimize semiconductor layers and devices. Several of these techniques are based on electron holography; others take advantage of the possibility of focusing intense beams within nanoprobes. Strain measurements and mappings, dopant activation and segregation, interfacial reactions at the nanoscale, defect identification and specimen preparation by FIB are among the topics presented in this book. After a brief presentation of the underlying theory, each technique is illustrated through examples from the lab or fab.
| Author | : Jian Min Zuo |
| Publisher | : Springer |
| Total Pages | : 741 |
| Release | : 2016-10-26 |
| Genre | : Technology & Engineering |
| ISBN | : 1493966073 |
This volume expands and updates the coverage in the authors' popular 1992 book, Electron Microdiffraction. As the title implies, the focus of the book has changed from electron microdiffraction and convergent beam electron diffraction to all forms of advanced transmission electron microscopy. Special attention is given to electron diffraction and imaging, including high-resolution TEM and STEM imaging, and the application of these methods to crystals, their defects, and nanostructures. The authoritative text summarizes and develops most of the useful knowledge which has been gained over the years from the study of the multiple electron scattering problem, the recent development of aberration correctors and their applications to materials structure characterization, as well as the authors' extensive teaching experience in these areas. Advanced Transmission Electron Microscopy: Imaging and Diffraction in Nanoscience is ideal for use as an advanced undergraduate or graduate level text in support of course materials in Materials Science, Physics or Chemistry departments.
| Author | : Renu Sharma |
| Publisher | : John Wiley & Sons |
| Total Pages | : 389 |
| Release | : 2023-05-15 |
| Genre | : Science |
| ISBN | : 3527347984 |
In-Situ Transmission Electron Microscopy Experiments Design and execute cutting-edge experiments with transmission electron microscopy using this essential guide In-situ microscopy is a recently-discovered and rapidly-developing approach to transmission electron microscopy (TEM) that allows for the study of atomic and/or molecular changes and processes while they are in progress. Experimental specimens are subjected to stimuli that replicate near real-world conditions and their effects are observed at a previously unprecedented scale. Though in-situ microscopy is becoming an increasingly important approach to TEM, there are no current texts combining an up-to-date overview of this cutting-edge set of techniques with the experience of in-situ TEM professionals. In-Situ Transmission Electron Microscopy Experiments meets this need with a work that synthesizes the collective experience of myriad collaborators. It constitutes a comprehensive guide for planning and performing in-situ TEM measurements, incorporating both fundamental principles and novel techniques. Its combination of technical detail and practical how-to advice makes it an indispensable introduction to this area of research. In-Situ Transmission Electron Microscopy Experiments readers will also find: Coverage of the entire experimental process, from method selection to experiment design to measurement and data analysis Detailed treatment of multimodal and correlative microscopy, data processing and machine learning, and more Discussion of future challenges and opportunities facing this field of research In-Situ Transmission Electron Microscopy Experiments is essential for graduate students, post-doctoral fellows, and early career researchers entering the field of in-situ TEM.
| Author | : Alina Bruma |
| Publisher | : CRC Press |
| Total Pages | : 162 |
| Release | : 2020-12-22 |
| Genre | : Technology & Engineering |
| ISBN | : 0429516169 |
Scanning Transmission Electron Microscopy: Advanced Characterization Methods for Materials Science Applications The information comprised in this book is focused on discussing the latest approaches in the recording of high-fidelity quantitative annular dark-field (ADF) data. It showcases the application of machine learning in electron microscopy and the latest advancements in image processing and data interpretation for materials notoriously difficult to analyze using scanning transmission electron microscopy (STEM). It also highlights strategies to record and interpret large electron diffraction datasets for the analysis of nanostructures. This book: Discusses existing approaches for experimental design in the recording of high-fidelity quantitative ADF data Presents the most common types of scintillator-photomultiplier ADF detectors, along with their strengths and weaknesses. Proposes strategies to minimize the introduction of errors from these detectors and avenues for dealing with residual errors Discusses the practice of reliable multiframe imaging, along with the benefits and new experimental opportunities it presents in electron dose or dose-rate management Focuses on supervised and unsupervised machine learning for electron microscopy Discusses open data formats, community-driven software, and data repositories Proposes methods to process information at both global and local scales, and discusses avenues to improve the storage, transfer, analysis, and interpretation of multidimensional datasets Provides the spectrum of possibilities to study materials at the resolution limit by means of new developments in instrumentation Recommends methods for quantitative structural characterization of sensitive nanomaterials using electron diffraction techniques and describes strategies to collect electron diffraction patterns for such materials This book helps academics, researchers, and industry professionals in materials science, chemistry, physics, and related fields to understand and apply computer-science–derived analysis methods to solve problems regarding data analysis and interpretation of materials properties.
| Author | : Florian Banhart |
| Publisher | : World Scientific |
| Total Pages | : 318 |
| Release | : 2008-07-29 |
| Genre | : Technology & Engineering |
| ISBN | : 9814471461 |
In-situ high-resolution electron microscopy is a modern and powerful technique in materials research, physics, and chemistry. In-situ techniques are hardly treated in textbooks of electron microscopy. Thus, there is a need to collect the present knowledge about the techniques and achievements of in-situ electron microscopy in one book. Since high-resolution electron microscopes are available in most modern laboratories of materials science, more and more scientists or students are starting to work on this subject.In this comprehensive volume, the most important techniques and achievements of in-situ high-resolution electron microscopy will be reviewed by renowned experts. Applications in several fields of materials science will also be demonstrated.
| Author | : Xiao-Feng Zhang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 342 |
| Release | : 2001-10-18 |
| Genre | : Medical |
| ISBN | : 9783540676812 |
Transmission electron microscopy (TEM) is now recognized as a crucial tool in materials science. This book, authored by a team of expert Chinese and international authors, covers many aspects of modern electron microscopy, from the architecture of novel electron microscopes, advanced theories and techniques in TEM and sample preparation, to a variety of hands-on examples of TEM applications. Volume 2 illustrates the important role that TEM is playing in the development and characterization of advanced materials, including nanostructures, interfacial structures, defects, and macromolecular complexes.
| Author | : David Cherns |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 413 |
| Release | : 2012-12-06 |
| Genre | : Medical |
| ISBN | : 1461305276 |
The last few years have ~een rapid improvements in semiconductor growth techniques which have produced an expanding range of high quality heterostructures for new semiconductor devises. As the dimensions of such structures approach the nanometer level, it becomes increasingly important to characterise materials properties such as composition uniformity, strain, interface sharpness and roughness and the nature of defects, as well as their influence on electrical and optical properties. Much of this information is being obtained by electron microscopy and this is also an area of rapid progress. There have been advances for thin film studies across a wide range of techniques, including, for example, convergent beam electron diffraction, X-ray and electron energy loss microanalysis and high spatial resolution cathodoluminescence as well as by conventional and high resolution methods. Important develop ments have also occurred in the study of surfaces and film growth phenomena by both microscopy and diffraction techniques. With these developments in mind, an application was made to the NATO Science Committee in late summer 1987 to fund an Advanced Research Work shop to review the electron microscopy of advanced semiconductors. This was subsequently accepted for the 1988 programme and became the "NATO Advanced Research Workshop on the Evaluation of Advanced Semiconductor Materials by Electron Microscopy". The Workshop took place in the pleasant and intimate surroundings of Wills Hall, Bristol, UK, during the week 11-17 September 1988 and was attended by fifty-five participants from fourteen countries.
| Author | : David G. Rickerby |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 503 |
| Release | : 2012-12-06 |
| Genre | : Technology & Engineering |
| ISBN | : 9401144516 |
The Advanced Study Institute provided an opportunity for researchers in universities, industry and National and International Laboratories, from the disciplines ofmaterials science, physics, chemistry and engineering to meet together in an assessment of the impact of electron and scanning probe microscopy on advanced material research. Since these researchers have traditionally relied upon different approaches, due to their different scientific background, to advanced materials problem solving, presentations and discussion within the Institute sessions were initially devoted to developing a set ofmutually understood basic concepts, inherently related to different techniques ofcharacterization by microscopy and spectroscopy. Particular importance was placed on Electron Energy Loss Spectroscopy (EELS), Scanning Probe Microscopy (SPM), High Resolution Transmission and Scanning Electron Microscopy (HRTEM, HRSTEM) and Environmental Scanning Electron Microscopy (ESEM). It was recognized that the electronic structure derived directly from EELS analysis as well as from atomic positions in HRTEM or High Angle Annular Dark Field STEM can be used to understand the macroscopic behaviour of materials. The emphasis, however, was upon the analysis of the electronic band structure of grain boundaries, fundamental for the understanding of macroscopic quantities such as strength, cohesion, plasticity, etc.
