In Situ Monitoring And Characterization Of Superhard Thin Film Growth Under Non Equilibrium Conditions PDF Download
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| Total Pages | : 0 |
| Release | : 2000 |
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Download In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions Book in PDF, ePub and Kindle
We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.
| Author | : Gertjan Koster |
| Publisher | : Elsevier |
| Total Pages | : 295 |
| Release | : 2011-10-05 |
| Genre | : Technology & Engineering |
| ISBN | : 0857094955 |
Download In Situ Characterization of Thin Film Growth Book in PDF, ePub and Kindle
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques
| Author | : Orlando Auciello |
| Publisher | : John Wiley & Sons |
| Total Pages | : 282 |
| Release | : 2001 |
| Genre | : Science |
| ISBN | : 9780471241416 |
Download In Situ Real-Time Characterization of Thin Films Book in PDF, ePub and Kindle
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application
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| Release | : 1995 |
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Download Why in Situ, Real-time Characterization of Thin Film Growth Processes? Book in PDF, ePub and Kindle
| Author | : Ulrich Schollwöck |
| Publisher | : Springer |
| Total Pages | : 488 |
| Release | : 2008-05-14 |
| Genre | : Science |
| ISBN | : 3540400664 |
Download Quantum Magnetism Book in PDF, ePub and Kindle
Closing a gap in the literature, this volume is intended both as an introductory text at postgraduate level and as a modern, comprehensive reference for researchers in the field. Provides a full working description of the main fundamental tools in the theorists toolbox which have proven themselves on the field of quantum magnetism in recent years. Concludes by focusing on the most important cuurent materials form an experimental viewpoint, thus linking back to the initial theoretical concepts.
| Author | : Ivan Nedkov |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 390 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 9401144931 |
Download Nano-Crystalline and Thin Film Magnetic Oxides Book in PDF, ePub and Kindle
Proceedings of the NATO Advanced Research Workshop on Ferrimagnetic Nano-crystalline and Thin Film Magnetooptical and Microwave Materials, Sozopol, Bulgaria, 27 September - 3 October, 1998
| Author | : Albano Cavaleiro |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 671 |
| Release | : 2007-02-19 |
| Genre | : Technology & Engineering |
| ISBN | : 0387487565 |
Download Nanostructured Coatings Book in PDF, ePub and Kindle
This book delivers practical insight into a broad range of fields related to hard coatings, from their deposition and characterization up to the hardening and deformation mechanisms allowing the interpretation of results. The text examines relationships between structure/microstructure and mechanical properties from fundamental concepts, through types of coatings, to characterization techniques. The authors explore the search for coatings that can satisfy the criteria for successful implementation in real mechanical applications.
| Author | : André Anders |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 555 |
| Release | : 2009-07-30 |
| Genre | : Science |
| ISBN | : 0387791086 |
Download Cathodic Arcs Book in PDF, ePub and Kindle
Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
| Author | : Anthony C. Fischer-Cripps |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 283 |
| Release | : 2013-03-09 |
| Genre | : Technology & Engineering |
| ISBN | : 1475759436 |
Download Nanoindentation Book in PDF, ePub and Kindle
This new edition of Nanoindentation includes a dedicated chapter on thin films, new material on dynamic analysis and creep, accounts of recent research, and three new appendices on nonlinear least squares fitting, frequently asked questions, and specifications for a nanoindentation instrument. Nanoindentation Second Edition is intended for those who are entering the field for the first time and to act as a reference for those already conversant with the technique.
| Author | : Y. Pauleau |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 372 |
| Release | : 2012-12-06 |
| Genre | : Technology & Engineering |
| ISBN | : 940100353X |
Download Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies Book in PDF, ePub and Kindle
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
