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In Situ Characterization of Thin Film Growth

In Situ Characterization of Thin Film Growth
Author: Gertjan Koster
Publisher: Elsevier
Total Pages: 295
Release: 2011-10-05
Genre: Technology & Engineering
ISBN: 0857094955

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Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques


In Situ Real-Time Characterization of Thin Films

In Situ Real-Time Characterization of Thin Films
Author: Orlando Auciello
Publisher: John Wiley & Sons
Total Pages: 282
Release: 2001
Genre: Science
ISBN: 9780471241416

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An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application


In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions

In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions
Author:
Publisher:
Total Pages: 12
Release: 2000
Genre:
ISBN:

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We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.


Advanced Characterization Techniques for Thin Film Solar Cells

Advanced Characterization Techniques for Thin Film Solar Cells
Author: Daniel Abou-Ras
Publisher: John Wiley & Sons
Total Pages: 760
Release: 2016-07-13
Genre: Science
ISBN: 3527699015

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The book focuses on advanced characterization methods for thin-film solar cells that have proven their relevance both for academic and corporate photovoltaic research and development. After an introduction to thin-film photovoltaics, highly experienced experts report on device and materials characterization methods such as electroluminescence analysis, capacitance spectroscopy, and various microscopy methods. In the final part of the book simulation techniques are presented which are used for ab-initio calculations of relevant semiconductors and for device simulations in 1D, 2D and 3D. Building on a proven concept, this new edition also covers thermography, transient optoelectronic methods, and absorption and photocurrent spectroscopy.


In-situ Characterization Techniques for Nanomaterials

In-situ Characterization Techniques for Nanomaterials
Author: Challa S.S.R. Kumar
Publisher: Springer
Total Pages: 452
Release: 2018-04-17
Genre: Technology & Engineering
ISBN: 3662563223

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Seventh volume of a 40 volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about In-situ Characterization Techniques for Nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.


Development of in situ methods for process monitoring and control and characterization of Cu-Zn-Sn-S based thin films

Development of in situ methods for process monitoring and control and characterization of Cu-Zn-Sn-S based thin films
Author: Van Duren, Stephan
Publisher: Universitätsverlag der TU Berlin
Total Pages: 188
Release: 2019-06-03
Genre: Technology & Engineering
ISBN: 3798330646

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In recent years, kesterite Cu2ZnSnS4 (CZTS) has become an interesting alternative to copper indium gallium (di)selenide (CIGS) due to its non-toxic and earth abundant constituents. A variety of methods is being used to fabricate kesterite thin films, such as coevaporation, sputtering, electrodeposition, spray pyrolysis and others. Most of them include an annealing step to stimulate elemental mixing and interdiffusion. Although conversion efficiencies of kesterite solar cells have increased among different research groups, the record value of 12.6% set by IBM in 2014 has not been broken yet. Therefore, experimental and theoretical studies are needed to predict the effect of the secondary phases and detrimental defects on the electronical properties of the CZTS based solar devices. The work presented here studies non-destructive techniques for in situ process control and monitoring. With the aim to detect phases and phase transitions to optimize crucial processing steps such as pre-annealing of metal precursors, high temperature annealing and vacuum deposition of Cu-Sn-Zn-S based thin films. The research consists of three parts in which Raman spectroscopy, X-ray diffraction (XRD) and reflectometry are used to explore this objective. In the first part Raman spectroscopy is investigated as an in situ monitoring technique during high temperature annealing of thin films. It investigates whether the occurrence of CZTS can be monitored when it is created from annealing a Mo/CTS/ZnS layered thin film. CuS, SnS, ZnS and CTS (Cu-Sn-S) films are prepared by physical vapor deposition. The Raman scattering intensity was compared to investigate whether their specific vibrational modes can be distinguished from each other at room temperature. Then, the CTS film is annealed between 50 and 550 °C in order to investigate whether CTS vibrational modes can be identified at elevated temperatures and to see which transitions take place within the thin film. Also, a CZTS reference film is annealed between 50 and 550 °C for reference purposes. The temperature dependence of the main CZTS modes is examined to investigate whether it can be used for in situ temperature control. Finally, a ZnS layer is deposited on the unannealed CTS film to obtain a Mo/CTS/ZnS layered film. This film is used to study the conversion of CTS/ZnS into CZTS at elevated temperatures. It was found that Raman spectroscopy can successfully be used to monitor formation of CZTS by identifying its main vibrational mode during the annealing process. The intensity of the CTS modes reduces at elevated temperatures. At 450 °C, the main CZTS mode at 338 cm-1 can be clearly identified. The second part also focuses on high temperature annealing. However, in this part the focus lies on annealing of the metal precursor films. It is explored whether specific alloys benefit or hinder the formation of secondary phases during formation of the CZTS absorber films. Also, to what extent this influences solar cell performance. In situ XRD was investigated for in situ monitoring of the pre-annealing process. Cu-poor metal precursor films are prepared by sputtering deposition. The precursors are annealed at 150 °C, 200 °C, 300 °C and 450 °C in a three zone tube furnace. The effect on the structural properties is analysed by XRD to study the formation mechanism of alloys. The precursor films are then sulfurized in a three zone tube furnace. The structural properties of the absorber are analysed and correlated with structures in the precursor. It is found that formation of SnS2 in the absorber is proportional to the remaining Sn in the pre-annealed precursor. Also, electron micrographs showed that pre-annealing temperature influences grain growth and surface precipitation of Sn-S and Zn-S. Pre-annealed absorbers at 450 °C did not exhibit these phases on the surface. Solar devices are fabricated from the absorber films and best performing devices were obtained from pre-annealed absorbers at 450 °C. They showed absence of Sn and SnS2 in, respectively, the precursor and absorber. It could be concluded that SnS2 phases are detrimental to device efficiency and that SnS2 XRD peak intensity follows an inverse proportionality with device efficiency. The third part explores reflectometry as a method to monitor a growing film during thermal evaporation in a physical vapor deposition (PVD) system. A set of six CZTS absorbers is examined by ex situ Raman spectroscopy and reflectometry to study the influence of secondary phases CuS and ZnS on reflection spectra. Composition strongly influences reflection spectra and CuS leaves a characteristic dip in the reflection spectrum at about 600 nm. An integration method was used to analyze this phenomenon quantitatively. Subsequently, a reflectometry setup is designed, developed and integrated in the PVD system. Four different CZTS co-evaporated and multi-layered films are deposited. Structural, morphological and vibrational properties are investigated. The reflection spectra are monitored during deposition and time-dependent reflection spectra are analyzed for characteristic aspects related to properties such as thickness, band gap and phase formation. CuS could not be detected in the films by the integration method due to the superposition of the CuS dip with developing interference fringes during film growth. However, in multilayered CTS/ZnS film it is found that the onset of ZnS deposition can be detected by increased reflection intensity due to reduced surface roughness. Additionally, the shifting onset of the interference fringes to lower photon energies can be used as a characteristic fingerprint during the deposition process. In conclusion, this work showed that Raman spectroscopy, XRD and reflectometry could be successfully implemented for in situ process control and monitoring of high temperature annealing and vacuum deposition of Cu-Sn-Zn-S based precursors and absorbers. The application of these in situ techniques can lead to the optimization of thin film material properties and solar cells. As such, this study has paved the way for further improvement of Cu-Sn-Zn-S based precursors and thin film absorbers. Innerhalb der letzten Jahre hat sich Kesterit Cu2ZnSnS4 (CZTS) aufgrund seiner ungiftigen Bestandteile und deren hoher Verfügbarkeit zu einer interessanten Alternative zu Kupfer Indium Gallium (di-)Selenid (CIGS) entwickelt. Zur Herstellung von Kesterit Dünnschichten wird eine Vielzahl von Methoden verwendet wie Ko-Verdampfung, Sputtern, Elektrodeposition, Spray Pyrolyse und andere. Die meisten davon beinhalten einen Temper-Schritt um die Durchmischung und Interdiffusion der Elemente zu stimulieren. Obwohl der Wirkungsgrad der Kersterit Solarzellen von verschiedenen Forschungsgruppen erhöht wurde, ist der Rekordwert von IBM von 12,6 % noch nicht gebrochen worden. Daher werden experimentelle und theoretische Studien benötigt, die den Einfluss von Fremdphasen und schädlichen Defekten auf die elektronischen Eigenschaften der CZTS Solarzellen vorhersagen. Die vorliegende Arbeit untersucht zerstörungsfreie Methoden für die in situ Prozesskontrolle und -überwachung. Dabei ist das Ziel, entscheidende Prozessschritte wie das Vortempern der Metall-Vorläufer sowie das Hochtemperatur-Tempern und die Vakuum-Abscheidung von Cu-Sn-Zn-S basierten Schichten zu optimieren. Die Untersuchung besteht aus drei Teilen, in denen Raman-Spektroskopie, Röntgendiffraktion (XRD) und Reflektometrie benutzt werden um dieses Ziel zu erreichen. Im ersten Teil wird die Ramanspektroskopie als in situ Methode zur Überwachung des Hochtemperatur-Temperns von Dünnschichten betrachtet. Es wird untersucht, ob das Entstehen von CZTS beim Tempern von gestapelten Mo/CTS/ZnS Dünnschichten beobachtet werden kann. CuS, SnS, ZnS und CTS (Cu-Sn-S) Schichten werden durch physikalische Gasabscheidung hergestellt. Die Intensität der Raman Streuung wurde vergleichen um zu untersuchen, ob die spezifischen Vibrations-Moden bei Raumtemperatur voneinander unterschieden werden können. Dann werden die CTS Schichten zwischen 50 °C und 550 °C getempert um zu untersuchen, ob die CTS Vibrations-Moden bei höheren Temperaturen identifiziert werden können und um festzustellen, welche Übergänge innerhalb der Schicht auftreten. Außerdem wurde eine CZTS Referenzschicht zwischen 50 °C und 550 °C für Referenzzwecke getempert worden. Die Temperaturabhängigkeit der CZTS Haupt-Moden werden betrachtet, um zu untersuche, ob sie für die in situ Temperaturüberwachung verwendet werden können. Abschließend wurde eine ZnS Schicht auf einem nicht getemperten CTS Film abgeschieden, um eine gestapelte Mo/CTS/ZnS Schicht zu erhalten. Diese Schicht wird verwendet, um die Umwandlung von CTS/ZnS zu CZTS bei erhöhten Temperaturen zu untersuchen. Es wurde festgestellt, dass Raman Spektroskopie erfolgreich verwendet werden kann, um die Bildung von CZTS zu überwachen, indem die Haupt-Vibrations-Moden während des Temperns identifiziert werden. Die Intensität der CTS Moden verringert sich bei höheren Temperaturen. Bei 450 °C kann die CZTS Hauptmode bei 338 cm-1 klar identifiziert werden. Der zweite Teil konzentriert sich ebenfalls auf das Hochtemperatur-Tempern. In diesem Teil liegt der Fokus allerdings auf dem Tempern der Metal-Vorläufer-Schichten. Es wird erforscht, ob bestimmte Legierungen die Entstehung von Fremdphasen während der Entstehung der CZTS Absorberschichten begünstigen oder hemmen und welchen Einfluss dies auf die Leistung der Solarzelle hat. In situ XRD wird verwendet, um die Prozesse des Vortemperns zu überwachen. Kupfer arme Metall-Vorläufer-Schichten werden durch Sputtern aufgetragen. Die Vorläufer werden bei 150 °C, 200 °C, 300 °C und 450 °C in einem Drei-Zonen-Röhren-Ofen getempert. Die Auswirkungen auf die strukturellen Eigenschaften werden mit XRD analysiert, um den Entstehungsmechanismus der Legierungen zu untersuchen. Die Vorläuferschichten werden dann in einem Drei-Zonen-Röhren-Ofen sulfurisiert. Die strukturellen Eigenschaften des Absorbers werden analysiert und mit der Struktur der Vorläufer korreliert. Es wurde festgestellt, dass die Entstehung von SnS2 im Absorber proportional zum verbleibenden Sn im vorgetemperten Vorläufer ist. Außerdem zeigen Bilder des Rasterelektronenmikroskops, dass die Temperatur des Vortemperns das Kornwachstum und das Abschieden von Sn-S und Zn-S an der Oberfläche beeinflusst. Bei 450 °C vorgetemperte Absorber weisen keine dieser Phasen an der Oberfläche auf. Solarzellen werden aus diesen Absorber-Schichten hergestellt und die besten Zellen entstanden aus den bei 450 °C vorgetemperten Absorbern. Bei diesen traten Sn und SnS2 weder im Vorläufer noch im Absorber auf. Es konnte geschlussfolgert werden, dass SnS2 Phasen schädlich für den Wirkungsgrad der Zellen sind und dass die Intensität der SnS2 XRD Peaks invers proportional zum Wirkungsgrad der Zellen ist. Der dritte Teil erforscht die Reflektometrie als Methode zur Überwachung des Schichtwachstums während des thermischen Verdampfens in einer Anlage zur physikalischen Gasabscheidung (PVD). Ein Satz aus sechs CZTS Absorbern wird mittels ex situ Raman-Spektroskopie und Reflektometrie vermessen, um den Einfluss der Fremdphasen CuS und ZnS auf die Reflexionsspektren zu untersuchen. Die Zusammensetzung beeinflusst die Reflexionsspektren stark und CuS hinterlässt eine charakteristische Senkung bei 600 nm im Reflexionsspektrum. Eine Integrationsmethode wurde verwendet um dieses Phänomen quantitativ zu analysieren. Anschließend wurde ein Reflektometrieaufbau entworfen, entwickelt und in die PVD-Anlage integriert. Vier verschiedene CZTS koverdampfte und Mehrschicht-Filme wurden abgeschieden. Strukturelle, morphologische und Vibrationseigenschaften werden untersucht. Die Reflexionsspektren werden während des Abscheidens aufgenommen und zeitabhängige Reflexionsspektren werden auf charakteristische Aspekte im Zusammenhang mit Eigenschaften wie Dicke, Bandlücke und Entstehung von Phasen untersucht. CuS konnte in den Schichten mit der Integrations-Methode wegen der Überlagerung der CuS Senkung mit dem entstehenden Interferenzmuster nicht detektiert werden. Allerdings wurde in gestapelten CTS/ZnS Schichten beobachtet werden, dass der Beginn der ZnS Abscheidung durch eine ansteigende Intensität der Reflektion aufgrund der verringerten Oberflächenrauigkeit detektiert werden kann. Zusätzlich kann die Verschiebung des Startpunkts der Interferenzen zu niedrigeren Photonenenergien als charakteristischer Fingerabdruck während des Abscheidungsprozesses verwendet werden. Zusammenfassend zeigt diese Arbeit, dass Raman-Spektroskopie, XRD und Reflektrometrie erfolgreich als in situ Prozesskontrolle und –überwachung bei Hochtemperatur-Tempern und Vakuum-Abscheidung von Cu-Sn-Zn-S basierten Vorläufern und Absorbern realisiert werden konnten. Die Anwendung dieser in situ Techniken kann zu einer Optimierung der Eigenschaften von Dünnschicht-Materialien und von Solarzellen führen. Als solche hat diese Untersuchung den Weg für weitere Verbesserung von Cu-Sn-Zn-S basierte Vorläufer und Dünnschicht-Absorber geebnet.


Ion Beams as a Means of Deposition and In-situ Characterization of Thin Films and Thin Film Layered Structures

Ion Beams as a Means of Deposition and In-situ Characterization of Thin Films and Thin Film Layered Structures
Author:
Publisher:
Total Pages: 27
Release: 1992
Genre:
ISBN:

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Ion beam-surface interactions produce many effects in thin film deposition which are similar to those encountered in plasma deposition processes. However, because of the lower pressures and higher directionality associated with the ion beam process, it is easier to avoid some sources of film contamination and to provide better control of ion energies and fluxes. Additional effects occur in the ion beam process because of the relatively small degree of thermalization resulting from gas phase collisions with both the ion beam and atoms sputtered from the target. These effects may be either beneficial or detrimental to the film properties, depending on the material and deposition conditions. Ion beam deposition is particularly suited to the deposition of multi-component films and layered structures, and can in principle be extended to a complete device fabrication process. However, complex phenomena occur in the deposition of many materials of high technical interest which make it desirable to monitor the film growth at the monolayer level. It is possible to make use of ion-surface interactions to provide a full suite of surface analytical capabilities in one instrument, and this data may be obtained at ambient pressures which are far too high for conventional surface analysis techniques. Such an instrument is under development and its current performance characteristics and anticipated capabilities are described.


Atmosphere Influence on in Situ Ion Beam Analysis of Thin Film Growth

Atmosphere Influence on in Situ Ion Beam Analysis of Thin Film Growth
Author:
Publisher:
Total Pages: 23
Release: 1994
Genre:
ISBN:

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In situ, nondestructive surface characterization of thin-film growth processes in an environment of chemically active gas at pressures of several mTorr is required both for the understanding of growth processes in multicomponent films and layered heterostructures and for the improvement of process reproducibility and device reliability. The authors have developed a differentially pumped pulsed ion beam surface analysis system that includes ion scattering spectroscopy (ISS) and direct recoil spectroscopy (DRS), coupled to an automated ion beam sputter-deposition system (IBSD), to study film growth processes in an environment of chemically active gas, such as required for the growth of oxide, nitride, or diamond thin films. The influence of gas-phase scattering and gas-surface interactions on the ISS and DRS signal intensity and peak shape have been studied. From the intensity variation as a function of ambient gas pressure, the authors have calculated the mean free path and the scattering cross-section for a given combination of primary ion species and ambient gas. Depending on the system geometry and the combination of primary beam and background, it is shown that surface-specific data can be obtained during thin-film growth at pressures ranging from a few mtorr to approximately 1 Torr. Detailed information such as surface composition, structure, and film growth mechanism may be obtained in real-time, making ion beam analysis an ideal nondestructive, in situ probe of thin-film growth processes.