Hot Carrier Effects In Mos Devices PDF Download

Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Hot Carrier Effects In Mos Devices PDF full book. Access full book title Hot Carrier Effects In Mos Devices.

Hot-Carrier Effects in MOS Devices

Hot-Carrier Effects in MOS Devices
Author: Eiji Takeda
Publisher: Elsevier
Total Pages: 329
Release: 1995-11-28
Genre: Technology & Engineering
ISBN: 0080926223

Download Hot-Carrier Effects in MOS Devices Book in PDF, ePub and Kindle

The exploding number of uses for ultrafast, ultrasmall integrated circuits has increased the importance of hot-carrier effects in manufacturing as well as for other technological applications. They are rapidly movingout of the research lab and into the real world. This book is derived from Dr. Takedas book in Japanese, Hot-Carrier Effects, (published in 1987 by Nikkei Business Publishers). However, the new book is much more than a translation. Takedas original work was a starting point for developing this much more complete and fundamental text on this increasingly important topic. The new work encompasses not only all the latest research and discoveries made in the fast-paced area of hot carriers, but also includes the basics of MOS devices, and the practical considerations related to hot carriers. Chapter one itself is a comprehensive review of MOS device physics which allows a reader with little background in MOS devices to pick up a sufficient amount of information to be able to follow the rest of the book The book is written to allow the reader to learn about MOS Device Reliability in a relatively short amount of time, making the texts detailed treatment of hot-carrier effects especially useful and instructive to both researchers and others with varyingamounts of experience in the field The logical organization of the book begins by discussing known principles, then progresses to empirical information and, finally, to practical solutions Provides the most complete review of device degradation mechanisms as well as drain engineering methods Contains the most extensive reference list on the subject


Hot Carrier Design Considerations for MOS Devices and Circuits

Hot Carrier Design Considerations for MOS Devices and Circuits
Author: Cheng Wang
Publisher: Springer Science & Business Media
Total Pages: 345
Release: 2012-12-06
Genre: Science
ISBN: 1468485474

Download Hot Carrier Design Considerations for MOS Devices and Circuits Book in PDF, ePub and Kindle

As device dimensions decrease, hot-carrier effects, which are due mainly to the presence of a high electric field inside the device, are becoming a major design concern. On the one hand, the detrimental effects-such as transconductance degradation and threshold shift-need to be minimized or, if possible, avoided altogether. On the other hand, performance such as the programming efficiency of nonvolatile memories or the carrier velocity inside the devices-need to be maintained or improved through the use of submicron technologies, even in the presence of a reduced power supply. As a result, one of the major challenges facing MOS design engineers today is to harness the hot-carrier effects so that, without sacrificing product performance, degradation can be kept to a minimum and a reli able design obtained. To accomplish this, the physical mechanisms re sponsible for the degradations should first be experimentally identified and characterized. With adequate models thus obtained, steps can be taken to optimize the design, so that an adequate level of quality assur ance in device or circuit performance can be achieved. This book ad dresses these hot-carrier design issues for MOS devices and circuits, and is used primarily as a professional guide for process development engi neers, device engineers, and circuit designers who are interested in the latest developments in hot-carrier degradation modeling and hot-carrier reliability design techniques. It may also be considered as a reference book for graduate students who have some research interests in this excit ing, yet sometime controversial, field.


Hot-Carrier Reliability of MOS VLSI Circuits

Hot-Carrier Reliability of MOS VLSI Circuits
Author: Yusuf Leblebici
Publisher: Springer Science & Business Media
Total Pages: 223
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 1461532507

Download Hot-Carrier Reliability of MOS VLSI Circuits Book in PDF, ePub and Kindle

As the complexity and the density of VLSI chips increase with shrinking design rules, the evaluation of long-term reliability of MOS VLSI circuits is becoming an important problem. The assessment and improvement of reliability on the circuit level should be based on both the failure mode analysis and the basic understanding of the physical failure mechanisms observed in integrated circuits. Hot-carrier induced degrada tion of MOS transistor characteristics is one of the primary mechanisms affecting the long-term reliability of MOS VLSI circuits. It is likely to become even more important in future generation chips, since the down ward scaling of transistor dimensions without proportional scaling of the operating voltage aggravates this problem. A thorough understanding of the physical mechanisms leading to hot-carrier related degradation of MOS transistors is a prerequisite for accurate circuit reliability evaluation. It is also being recognized that important reliability concerns other than the post-manufacture reliability qualification need to be addressed rigorously early in the design phase. The development and use of accurate reliability simulation tools are therefore crucial for early assessment and improvement of circuit reliability : Once the long-term reliability of the circuit is estimated through simulation, the results can be compared with predetermined reliability specifications or limits. If the predicted reliability does not satisfy the requirements, appropriate design modifications may be carried out to improve the resistance of the devices to degradation.


Hot Carrier Degradation in Semiconductor Devices

Hot Carrier Degradation in Semiconductor Devices
Author: Tibor Grasser
Publisher: Springer
Total Pages: 518
Release: 2014-10-29
Genre: Technology & Engineering
ISBN: 3319089943

Download Hot Carrier Degradation in Semiconductor Devices Book in PDF, ePub and Kindle

This book provides readers with a variety of tools to address the challenges posed by hot carrier degradation, one of today’s most complicated reliability issues in semiconductor devices. Coverage includes an explanation of carrier transport within devices and book-keeping of how they acquire energy (“become hot”), interaction of an ensemble of colder and hotter carriers with defect precursors, which eventually leads to the creation of a defect, and a description of how these defects interact with the device, degrading its performance.


Ionizing Radiation Effects in MOS Devices and Circuits

Ionizing Radiation Effects in MOS Devices and Circuits
Author: T. P. Ma
Publisher: John Wiley & Sons
Total Pages: 616
Release: 1989-04-18
Genre: Technology & Engineering
ISBN: 9780471848936

Download Ionizing Radiation Effects in MOS Devices and Circuits Book in PDF, ePub and Kindle

The first comprehensive overview describing the effects of ionizing radiation on MOS devices, as well as how to design, fabricate, and test integrated circuits intended for use in a radiation environment. Also addresses process-induced radiation effects in the fabrication of high-density circuits. Reviews the history of radiation-hard technology, providing background information for those new to the field. Includes a comprehensive review of the literature and an annotated listing of research activities in radiation-hardness research.


Study of Oxide Breakdown, Hot Carrier and NBTI Effects on MOS Device and Circuit Reliability

Study of Oxide Breakdown, Hot Carrier and NBTI Effects on MOS Device and Circuit Reliability
Author: Yi Liu
Publisher:
Total Pages: 103
Release: 2005
Genre:
ISBN:

Download Study of Oxide Breakdown, Hot Carrier and NBTI Effects on MOS Device and Circuit Reliability Book in PDF, ePub and Kindle

As CMOS device sizes shrink, the channel electric field becomes higher and the hot carrier (HC) effect becomes more significant. When the oxide is scaled down to less than 3 nm, gate oxide breakdown (BD) often takes place. As a result, oxide trapping and interface generation cause long term performance drift and related reliability problems in devices and circuits.


MOSFET Models for VLSI Circuit Simulation

MOSFET Models for VLSI Circuit Simulation
Author: Narain D. Arora
Publisher: Springer Science & Business Media
Total Pages: 628
Release: 2012-12-06
Genre: Computers
ISBN: 3709192471

Download MOSFET Models for VLSI Circuit Simulation Book in PDF, ePub and Kindle

Metal Oxide Semiconductor (MOS) transistors are the basic building block ofMOS integrated circuits (I C). Very Large Scale Integrated (VLSI) circuits using MOS technology have emerged as the dominant technology in the semiconductor industry. Over the past decade, the complexity of MOS IC's has increased at an astonishing rate. This is realized mainly through the reduction of MOS transistor dimensions in addition to the improvements in processing. Today VLSI circuits with over 3 million transistors on a chip, with effective or electrical channel lengths of 0. 5 microns, are in volume production. Designing such complex chips is virtually impossible without simulation tools which help to predict circuit behavior before actual circuits are fabricated. However, the utility of simulators as a tool for the design and analysis of circuits depends on the adequacy of the device models used in the simulator. This problem is further aggravated by the technology trend towards smaller and smaller device dimensions which increases the complexity of the models. There is extensive literature available on modeling these short channel devices. However, there is a lot of confusion too. Often it is not clear what model to use and which model parameter values are important and how to determine them. After working over 15 years in the field of semiconductor device modeling, I have felt the need for a book which can fill the gap between the theory and the practice of MOS transistor modeling. This book is an attempt in that direction.