Epitaxial Growth of Functional Oxides
| Author | : Amit Goyal |
| Publisher | : |
| Total Pages | : 422 |
| Release | : 2005-01-01 |
| Genre | : Epitaxy |
| ISBN | : 9781566774529 |
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Epitaxial Growth of Complex Metal Oxides
| Author | : Gertjan Koster |
| Publisher | : Woodhead Publishing |
| Total Pages | : 534 |
| Release | : 2022-04-22 |
| Genre | : Science |
| ISBN | : 0081029462 |
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Epitaxial Growth of Complex Metal Oxides, Second Edition reviews techniques and recent developments in the fabrication quality of complex metal oxides, which are facilitating advances in electronic, magnetic and optical applications. Sections review the key techniques involved in the epitaxial growth of complex metal oxides and explore the effects of strain and stoichiometry on crystal structure and related properties in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films, including optoelectronics, batteries, spintronics and neuromorphic applications. This new edition has been fully updated, with brand new chapters on topics such as atomic layer deposition, interfaces, STEM-EELs, and the epitaxial growth of multiferroics, ferroelectrics and nanocomposites. Examines the techniques used in epitaxial thin film growth for complex oxides, including atomic layer deposition, sputtering techniques, molecular beam epitaxy, and chemical solution deposition techniques Reviews materials design strategies and materials property analysis methods, including the impacts of defects, strain, interfaces and stoichiometry Describes key applications of epitaxially grown metal oxides, including optoelectronics, batteries, spintronics and neuromorphic applications
Integration of Functional Oxides with Semiconductors
| Author | : Alexander A. Demkov |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 284 |
| Release | : 2014-02-20 |
| Genre | : Technology & Engineering |
| ISBN | : 146149320X |
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This book describes the basic physical principles of the oxide/semiconductor epitaxy and offers a view of the current state of the field. It shows how this technology enables large-scale integration of oxide electronic and photonic devices and describes possible hybrid semiconductor/oxide systems. The book incorporates both theoretical and experimental advances to explore the heteroepitaxy of tuned functional oxides and semiconductors to identify material, device and characterization challenges and to present the incredible potential in the realization of multifunctional devices and monolithic integration of materials and devices. Intended for a multidisciplined audience, Integration of Functional Oxides with Semiconductors describes processing techniques that enable atomic-level control of stoichiometry and structure and reviews characterization techniques for films, interfaces and device performance parameters. Fundamental challenges involved in joining covalent and ionic systems, chemical interactions at interfaces, multi-element materials that are sensitive to atomic-level compositional and structural changes are discussed in the context of the latest literature. Magnetic, ferroelectric and piezoelectric materials and the coupling between them will also be discussed. GaN, SiC, Si, GaAs and Ge semiconductors are covered within the context of optimizing next-generation device performance for monolithic device processing.
Epitaxial Oxide Thin Films II: Volume 401
| Author | : James S. Speck |
| Publisher | : |
| Total Pages | : 588 |
| Release | : 1996-03-29 |
| Genre | : Science |
| ISBN | : |
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Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.
Epitaxial Growth of Complex Metal Oxides: Techniques, Properties and Applications
| Author | : |
| Publisher | : |
| Total Pages | : |
| Release | : |
| Genre | : |
| ISBN | : |
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Reglement der Brand-Assecurations-Societät
| Author | : |
| Publisher | : |
| Total Pages | : 12 |
| Release | : 1769 |
| Genre | : |
| ISBN | : |
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Epitaxy of Crystalline Oxides for Functional Materials Integration on Silicon
| Author | : Gang Niu |
| Publisher | : |
| Total Pages | : 231 |
| Release | : 2010 |
| Genre | : |
| ISBN | : |
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Oxides form a class of material which covers almost all the spectra of functionalities : dielectricity, semiconductivity, metallicity superconductivity, non-linear optics, acoustics, piezoelectricity, ferroelectricity, ferromagnetism...In this thesis, crystalline oxides have beenintegrated on the workhorse of the semiconductor industry, the silicon, by Molecular Beam Epitaxy (MBE).The first great interest of the epitaxial growth of crystalline oxides on silicon consists in the application of "high-k" dielectric for future sub-22nm CMOS technology. Gadoliniumoxide was explored in detail as a promising candidate of the alternative of SiO2. The pseudomorphic epitaxial growth of Gd2O3 on Si (111) was realized by identifying the optimal growth conditions. The Gd2O3 films show good dielectric properties and particularly an EOTof 0.73nm with a leakage current consistent with the requirements of ITRS for the sub-22nmnodes. In addition, the dielectric behavior of Gd2O3 thin films was further improved by performing PDA treatments. The second research interest on crystalline oxide/Si platform results from its potential application for the "More than Moore" and "Heterogeneous integration" technologies. TheSrTiO3/Si (001) was intensively studied as a paradigm of the integration of oxides on semiconductors. The crystallinity, interface and surface qualities and relaxation process of the STO films on silicon grown at the optimal conditions were investigated and analyzed. Several optimized growth processes were carried out and compared. Finally a "substrate-like" STO thin film was obtained on the silicon substrate with good crystallinity and atomic flat surface. Based on the Gd2O3/Si and SrTiO3/Si templates, diverse functionalities were integrated on the silicon substrate, such as ferro-(piezo-)electricity (BaTiO3, PZT and PMN-PT),ferromagnetism (LSMO) and optoelectronics (Ge). These functional materials epitaxially grown on Si can be widely used for storage memories, lasers and solar cells, etc.
Metal Oxide-Based Thin Film Structures
| Author | : Nini Pryds |
| Publisher | : Elsevier |
| Total Pages | : 562 |
| Release | : 2017-09-07 |
| Genre | : Technology & Engineering |
| ISBN | : 0081017529 |
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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike
Correlated Functional Oxides
| Author | : Hiroaki Nishikawa |
| Publisher | : Springer |
| Total Pages | : 241 |
| Release | : 2016-11-01 |
| Genre | : Technology & Engineering |
| ISBN | : 3319437798 |
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This book introduces a variety of basic sciences and applications of the nanocomposites and heterostructures of functional oxides. The presence of a high density of interfaces and the differences in their natures are described by the authors. Both nanocomposites and heterostructures are detailed in depth by researchers from each of the research areas in order to compare their similarities and differences. A new interfacial material of heterostructure of strongly correlated electron systems is introduced.
Advanced Ceramic Materials
| Author | : Ashutosh Tiwari |
| Publisher | : John Wiley & Sons |
| Total Pages | : 448 |
| Release | : 2016-08-12 |
| Genre | : Technology & Engineering |
| ISBN | : 111924272X |
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Ceramic materials are inorganic and non-metallic porcelains, tiles, enamels, cements, glasses and refractory bricks. Today, "ceramics" has gained a wider meaning as a new generation of materials influence on our lives; electronics, computers, communications, aerospace and other industries rely on a number of their uses. In general, advanced ceramic materials include electro-ceramics, optoelectronic-ceramics, superconductive ceramics and the more recent development of piezoelectric and dielectric ceramics. They can be considered for their features including mechanical properties, decorative textures, environmental uses, energy applications, as well as their usage in bio-ceramics, composites, functionally graded materials, intelligent ceramics and so on. Advanced Ceramic Materials brings together a group of subject matter experts who describe innovative methodologies and strategies adopted in the research and development of the advanced ceramic materials. The book is written for readers from diverse backgrounds across chemistry, physics, materials science and engineering, medical science, pharmacy, environmental technology, biotechnology, and biomedical engineering. It offers a comprehensive view of cutting-edge research on ceramic materials and technologies. Divided into 3 parts concerning design, composites and functionality, the topics discussed include: Chemical strategies of epitaxial oxide ceramics nanomaterials Biphasic, triphasic and multiphasic calcium orthophosphates Microwave assisted processing of advanced ceramic composites Continuous fiber reinforced ceramic matrix composites Yytria and magnesia doped alumina ceramic Oxidation induced crack healing SWCNTs vs MWCNTs reinforcement agents Organic and inorganic wastes in clay brick production Functional tantalum oxides Application of silver tin research on hydroxyapatite
