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Emerging Lithographic Technologies VIII

Emerging Lithographic Technologies VIII
Author: R. Scott Mackay
Publisher: SPIE-International Society for Optical Engineering
Total Pages: 576
Release: 2004
Genre: Science
ISBN:

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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.


Document and Image Compression

Document and Image Compression
Author: Mauro Barni
Publisher: CRC Press
Total Pages: 456
Release: 2018-10-08
Genre: Technology & Engineering
ISBN: 1420018833

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Although it's true that image compression research is a mature field, continued improvements in computing power and image representation tools keep the field spry. Faster processors enable previously intractable compression algorithms and schemes, and certainly the demand for highly portable high-quality images will not abate. Document and Image Compression highlights the current state of the field along with the most probable and promising future research directions for image coding. Organized into three broad sections, the book examines the currently available techniques, future directions, and techniques for specific classes of images. It begins with an introduction to multiresolution image representation, advanced coding and modeling techniques, and the basics of perceptual image coding. This leads to discussions of the JPEG 2000 and JPEG-LS standards, lossless coding, and fractal image compression. New directions are highlighted that involve image coding and representation paradigms beyond the wavelet-based framework, the use of redundant dictionaries, the distributed source coding paradigm, and novel data-hiding techniques. The book concludes with techniques developed for classes of images where the general-purpose algorithms fail, such as for binary images and shapes, compound documents, remote sensing images, medical images, and VLSI layout image data. Contributed by international experts, Document and Image Compression gathers the latest and most important developments in image coding into a single, convenient, and authoritative source.


Alternative Lithographic Technologies VIII

Alternative Lithographic Technologies VIII
Author: Christopher Bencher
Publisher:
Total Pages: 440
Release: 2016
Genre: Electronic book
ISBN:

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Annotation 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields.


Emerging Lithographic Technologies IV

Emerging Lithographic Technologies IV
Author: Elizabeth Ann Dobisz
Publisher: Society of Photo Optical
Total Pages: 900
Release: 2000
Genre: Technology & Engineering
ISBN: 9780819436153

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VLSI Circuit Design Methodology Demystified

VLSI Circuit Design Methodology Demystified
Author: Liming Xiu
Publisher: John Wiley & Sons
Total Pages: 222
Release: 2007-12-04
Genre: Technology & Engineering
ISBN: 0470199105

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This book was written to arm engineers qualified and knowledgeable in the area of VLSI circuits with the essential knowledge they need to get into this exciting field and to help those already in it achieve a higher level of proficiency. Few people truly understand how a large chip is developed, but an understanding of the whole process is necessary to appreciate the importance of each part of it and to understand the process from concept to silicon. It will teach readers how to become better engineers through a practical approach of diagnosing and attacking real-world problems.


Recent Advances in Nanofabrication Techniques and Applications

Recent Advances in Nanofabrication Techniques and Applications
Author: Bo Cui
Publisher: BoD – Books on Demand
Total Pages: 630
Release: 2011-12-02
Genre: Science
ISBN: 953307602X

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Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.