Data Compendium for Plasma-surface Interactions
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Total Pages | : |
Release | : 1984 |
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Total Pages | : |
Release | : 1984 |
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Author | : Cornelius Betten |
Publisher | : |
Total Pages | : 0 |
Release | : 1934 |
Genre | : Caddisflies |
ISBN | : 9789201390844 |
Author | : R. A. Langley |
Publisher | : |
Total Pages | : 128 |
Release | : 1984 |
Genre | : Business & Economics |
ISBN | : |
Author | : Dirk Naujoks |
Publisher | : Springer Science & Business Media |
Total Pages | : 279 |
Release | : 2006-08-25 |
Genre | : Technology & Engineering |
ISBN | : 3540321497 |
This book deals with the specific contact between the fourth state of matter, i.e. plasma, and the first state of matter, i.e. a solid wall, in controlled fusion experiments. A comprehensive analysis of the main processes of plasma-surface interaction is given together with an assessment of the most critical questions within the context of general criteria and operation limits. It also contains a survey on other important aspects in nuclear fusion.
Author | : |
Publisher | : |
Total Pages | : 208 |
Release | : 2001 |
Genre | : Controlled fusion |
ISBN | : |
Author | : O. Auciello |
Publisher | : Springer Science & Business Media |
Total Pages | : 548 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 9400919468 |
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Author | : Kenjirou Matsuhiro |
Publisher | : |
Total Pages | : 47 |
Release | : 2002 |
Genre | : |
ISBN | : |
Author | : Adam T. Drobot |
Publisher | : Springer Science & Business Media |
Total Pages | : 466 |
Release | : 2012-12-06 |
Genre | : Computers |
ISBN | : 1461230926 |
This volume, which contains 15 contributions, is based on a minicourse held at the 1987 IEEE Plasma Science Meeting. The purpose of the lectures in the course was to acquaint the students with the multidisciplinary nature of computational techniques and the breadth of research areas in plasma science in which computation can address important physics and engineering design issues. These involve: electric and magnetic fields, MHD equations, chemistry, radiation, ionization etc. The contents of the contributions, written subsequent to the minicourse, stress important aspects of computer applications. They are: 1) the numerical methods used; 2) the range of applicability; 3) how the methods are actually employed in research and in the design of devices; and, as a compendium, 4) the multiplicity of approaches possible for any one problem. The materials in this book are organized by both subject and applications which display some of the richness in computational plasma physics.
Author | : John Wesson |
Publisher | : Oxford University Press |
Total Pages | : 828 |
Release | : 2011-10-13 |
Genre | : Science |
ISBN | : 0199592233 |
The tokamak is the principal tool in controlled fusion research. This book acts as an introduction to the subject and a basic reference for theory, definitions, equations, and experimental results. The fourth edition has been completely revised, describing their development of tokamaks to the point of producing significant fusion power.
Author | : Toshiaki Makabe |
Publisher | : CRC Press |
Total Pages | : 355 |
Release | : 2006-03-27 |
Genre | : Science |
ISBN | : 1420012274 |
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,