Composition Depth Profiles And The Effects Of Annealing For Ion Implated Alloys PDF Download
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Author | : Arthur B. Campbell |
Publisher | : |
Total Pages | : 32 |
Release | : 1979 |
Genre | : Alloys |
ISBN | : |
Download Composition Depth Profiles and the Effects of Annealing for Ion-implated Alloys Book in PDF, ePub and Kindle
Author | : |
Publisher | : |
Total Pages | : 652 |
Release | : 1995 |
Genre | : Aeronautics |
ISBN | : |
Download Scientific and Technical Aerospace Reports Book in PDF, ePub and Kindle
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author | : |
Publisher | : |
Total Pages | : 728 |
Release | : 1979 |
Genre | : Mineral industries |
ISBN | : |
Download Report of Investigations Book in PDF, ePub and Kindle
Author | : William J. Karwoski |
Publisher | : |
Total Pages | : 480 |
Release | : 1979 |
Genre | : Blasting |
ISBN | : |
Download Rock Preconditioning to Prevent Rock Bursts Book in PDF, ePub and Kindle
Author | : United States. Bureau of Mines |
Publisher | : |
Total Pages | : 574 |
Release | : |
Genre | : Mineral industries |
ISBN | : |
Download List of Bureau of Mines Publications and Articles ... with Subject and Author Index Book in PDF, ePub and Kindle
Author | : United States. Bureau of Mines |
Publisher | : |
Total Pages | : 160 |
Release | : 1981 |
Genre | : Fuel |
ISBN | : |
Download Bureau of Mines Research Book in PDF, ePub and Kindle
Author | : |
Publisher | : |
Total Pages | : 1128 |
Release | : 1980-03 |
Genre | : Government publications |
ISBN | : |
Download Monthly Catalogue, United States Public Documents Book in PDF, ePub and Kindle
Author | : United States. Superintendent of Documents |
Publisher | : |
Total Pages | : 1256 |
Release | : 1968 |
Genre | : Government publications |
ISBN | : |
Download Monthly Catalog of United States Government Publications Book in PDF, ePub and Kindle
Author | : A. H. Agajanian |
Publisher | : Springer |
Total Pages | : 282 |
Release | : 1981-09-30 |
Genre | : Reference |
ISBN | : |
Download Ion Implantation in Microelectronics Book in PDF, ePub and Kindle
During the past ten years the use of ion implantation for doping semiconductors has become an active area of research and new device development. This doping technique has recently reached a level of maturity such that it is an integral step in the manu facturing of discrete semiconductor devices and integrated circuits. Ion implantation has significant advantages over diffusion such as: precision, purity, versatility, and automation; all of which are important for VLSI purposes. Ion implantation has also found new applications in magnetic bubble domain materials, superconductors, and materials synthesis. This book is a comprehensive bibliography of 2467 references of the world's literature on ion implantation as applied to micro electronics. This compilation will easily enable researchers to compare their work with that of others. For easy access to the needed references, the contents are divided into fifty-two subject headings. The main categories are: bibliographies, books and symposia, review articles, theory, materials, device applications, and equipment. An author index and a subject index are also given to provide easy access to the references. The literature from January 1976 to December 1980 is covered. The literature prior to 1976 is the subject, in part, of a previous book by the author (1). The main sources searched were: Physics Abstracts (PA) , Electrical and Electronics Abstracts (EEA) , Chemical Abstracts (CA) , Nuclear Science Abstracts (NSA) , and Engineering Index. The volumes and numbers of the abstracts are given to pro vide access to the abstracts.
Author | : S.U. Campisano |
Publisher | : Elsevier |
Total Pages | : 320 |
Release | : 1992-06-16 |
Genre | : Technology & Engineering |
ISBN | : 0444596798 |
Download High Energy and High Dose Ion Implantation Book in PDF, ePub and Kindle
Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.