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Author | : Arthur Sherman |
Publisher | : William Andrew |
Total Pages | : 240 |
Release | : 1987 |
Genre | : Computers |
ISBN | : |
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Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author | : Arthur Sherman |
Publisher | : |
Total Pages | : 215 |
Release | : 1987 |
Genre | : |
ISBN | : |
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Author | : Srinivasan Sivaram |
Publisher | : Springer Science & Business Media |
Total Pages | : 302 |
Release | : 2013-11-11 |
Genre | : Technology & Engineering |
ISBN | : 1475747519 |
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In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 458 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 1437744885 |
Download Handbook of Chemical Vapor Deposition Book in PDF, ePub and Kindle
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author | : Chris R. Kleijn |
Publisher | : Birkhäuser |
Total Pages | : 138 |
Release | : 2013-11-11 |
Genre | : Science |
ISBN | : 3034877412 |
Download Modeling of Chemical Vapor Deposition of Tungsten Films Book in PDF, ePub and Kindle
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Author | : Anthony C. Jones |
Publisher | : Royal Society of Chemistry |
Total Pages | : 600 |
Release | : 2009 |
Genre | : Science |
ISBN | : 0854044655 |
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"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author | : Rafael Reif |
Publisher | : |
Total Pages | : 28 |
Release | : 1985 |
Genre | : Plasma (Ionized gases) |
ISBN | : |
Download Plasma Enhanced Chemical Vapor Deposition for Microelectronics Book in PDF, ePub and Kindle
Author | : Levi Karlsson |
Publisher | : |
Total Pages | : 0 |
Release | : 2021 |
Genre | : Chemical vapor deposition |
ISBN | : 9781536199499 |
Download Chemical Vapor Deposition (CVD). Book in PDF, ePub and Kindle
Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.
Author | : Jong-Hee Park |
Publisher | : ASM International |
Total Pages | : 477 |
Release | : 2001 |
Genre | : Technology & Engineering |
ISBN | : 161503224X |
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Author | : Y. Pauleau |
Publisher | : Springer Science & Business Media |
Total Pages | : 372 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 940100353X |
Download Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies Book in PDF, ePub and Kindle
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.