Chemical Mechanical Polishing Of Silicon And Silicon Dioxide In Front End Processing PDF Download
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Author | : Markus Forsberg |
Publisher | : |
Total Pages | : 65 |
Release | : 2004 |
Genre | : |
ISBN | : 9789155459956 |
Download Chemical Mechanical Polishing of Silicon and Silicon Dioxide in Front End Processing Book in PDF, ePub and Kindle
Author | : |
Publisher | : Academic Press |
Total Pages | : 325 |
Release | : 1999-10-29 |
Genre | : Science |
ISBN | : 0080864619 |
Download Chemical Mechanical Polishing in Silicon Processing Book in PDF, ePub and Kindle
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Author | : Uday Mahajan |
Publisher | : |
Total Pages | : 356 |
Release | : 2000 |
Genre | : |
ISBN | : |
Download Fundamental Studies on Silicon Dioxide Chemical Mechanical Polishing Book in PDF, ePub and Kindle
Author | : Christopher Lyle Borst |
Publisher | : Springer Science & Business Media |
Total Pages | : 235 |
Release | : 2013-11-27 |
Genre | : Technology & Engineering |
ISBN | : 1461511658 |
Download Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses Book in PDF, ePub and Kindle
As semiconductor manufacturers implement copper conductors in advanced interconnect schemes, research and development efforts shift toward the selection of an insulator that can take maximum advantage of the lower power and faster signal propagation allowed by copper interconnects. One of the main challenges to integrating a low-dielectric constant (low-kappa) insulator as a replacement for silicon dioxide is the behavior of such materials during the chemical-mechanical planarization (CMP) process used in Damascene patterning. Low-kappa dielectrics tend to be softer and less chemically reactive than silicon dioxide, providing significant challenges to successful removal and planarization of such materials. The focus of this book is to merge the complex CMP models and mechanisms that have evolved in the past decade with recent experimental results with copper and low-kappa CMP to develop a comprehensive mechanism for low- and high-removal-rate processes. The result is a more in-depth look into the fundamental reaction kinetics that alter, selectively consume, and ultimately planarize a multi-material structure during Damascene patterning.
Author | : Yuzhuo Li |
Publisher | : John Wiley & Sons |
Total Pages | : 764 |
Release | : 2007-10-19 |
Genre | : Technology & Engineering |
ISBN | : 0471719196 |
Download Microelectronic Applications of Chemical Mechanical Planarization Book in PDF, ePub and Kindle
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
Author | : G. Banerjee |
Publisher | : The Electrochemical Society |
Total Pages | : 145 |
Release | : 2009-05 |
Genre | : Science |
ISBN | : 1566777232 |
Download Chemical Mechanical Polishing 10 Book in PDF, ePub and Kindle
The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Chemical Mechanical Polishing 10¿, held during the 215th meeting of The Electrochemical Society, in San Francisco, California from May 24 to 29, 2009.
Author | : |
Publisher | : |
Total Pages | : 312 |
Release | : 2001 |
Genre | : Electrolytic polishing |
ISBN | : |
Download Chemical-mechanical Polishing Book in PDF, ePub and Kindle
Author | : Robert K. Willardson |
Publisher | : |
Total Pages | : 307 |
Release | : 2000 |
Genre | : |
ISBN | : |
Download Semiconductors and Semimetals Book in PDF, ePub and Kindle
Author | : M.R. Oliver |
Publisher | : Springer Science & Business Media |
Total Pages | : 432 |
Release | : 2013-03-14 |
Genre | : Technology & Engineering |
ISBN | : 3662062348 |
Download Chemical-Mechanical Planarization of Semiconductor Materials Book in PDF, ePub and Kindle
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
Author | : G. Banerjee |
Publisher | : The Electrochemical Society |
Total Pages | : 91 |
Release | : 2008-05 |
Genre | : Science |
ISBN | : 1566776295 |
Download Chemical Mechanical Polishing 9 Book in PDF, ePub and Kindle
The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Chemical Mechanical Polishing 9¿, held during the 213th meeting of The Electrochemical Society, in Phoenix, Arizona from May 18-23, 2008.