Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Boron Nitride Coatings And Diffusion Of Boron Into Semiconductive Wafers PDF full book. Access full book title Boron Nitride Coatings And Diffusion Of Boron Into Semiconductive Wafers.
| Author | : Rudolf G. Frieser |
| Publisher | : |
| Total Pages | : 2 |
| Release | : 1962 |
| Genre | : Boron nitride |
| ISBN | : |
| Author | : |
| Publisher | : |
| Total Pages | : 354 |
| Release | : 1963 |
| Genre | : Ceramic metals |
| ISBN | : |
| Author | : |
| Publisher | : |
| Total Pages | : 912 |
| Release | : 2002 |
| Genre | : Patents |
| ISBN | : |
| Author | : Ram Gupta |
| Publisher | : Elsevier |
| Total Pages | : 524 |
| Release | : 2023-06-20 |
| Genre | : Technology & Engineering |
| ISBN | : 0323996604 |
Handbook of Advanced Ceramic Coatings: Fundamentals, Manufacturing and Classification introduces ceramic coating materials, methods of fabrication, characterizations, the interaction between fillers, reinforcers, and environmental impact, and the functional classification of ceramic coatings. The book is one of four volumes that together provide a comprehensive resource in the field of Advanced Ceramic Coatings, also including titles covering energy, biomedical and emerging applications. These books will be extremely useful for academic and industrial researchers and practicing engineers who need to find reliable and up-to-date information about recent progresses and new developments in the field of advanced ceramic coatings. Smart ceramic coatings containing multifunctional components are now finding application in transportation and automotive industries, in electronics, and energy sectors, in aerospace and defense, and in industrial goods and healthcare. Their wide application and stability in harsh environments are only possible due to the stability of the inorganic components used. Ceramic coatings are typically silicon nitride, chromia, hafnia, alumina, alumina-magnesia, silica, silicon carbide, titania, and zirconia-based compositions. The increased demand for these materials and their application in energy, transportation, and the automotive industry, are considered, to be the main drivers. Comprehensively covers the production, characterization and properties of advanced ceramic coatings Features the latest manufacturing processes Covers basic principles of surface chemistry, along with the fundamentals of ceramic materials and engineering Features the latest progress and recent technological developments Discusses basic science relevant to both the materials and preparation methods
| Author | : Anton Meller |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 278 |
| Release | : 2013-03-09 |
| Genre | : Science |
| ISBN | : 3662061414 |
The present issue, Volume 3a of "Boron Compounds" 4th Supplement of the Gmelin Hand book, presents the description of boron nitride and a part of other boron compounds containing nitrogen. Volume 3 b (to be published Later) will complete the presentation of the boron-nitrogen compounds and will also cover boron compounds containing fluorine. Due to technical circumstances, Volume 1 (systems with hydrogen) and Volume 2 (systems with oxygen) of this particular supplement will be published subsequently, whereas Volume 4 (boron compounds containing CL, Br, I, S, Se, and Te, as well as a section containing carboranes) has already been published. ALL volumes of the 4th Supplement will be augmented by a formula index. The IUPAC nomenclature is generally adhered to; occasional abbreviations for compounds are explained in the text. A positive sign for the chemical shifts of the NMR signals indicates a 1 13 downfield shift from the references, usually internal (CH ) Si for 6 H and 6 C and external 3 4 11 (C H h0-BF for 6 B, others being specified. 2 5 3 In contrast to more recent publications but remaining consistent with the previous volumes of the Boron Series, the iminoborane structure is written as B=N and not as B=N. In fact, the real electronic structure is more realistically symbolized by B=N, but it seems reasonable to avoid =NR in accordance with the commonly accepted "iminoborane" nomenclature.
| Author | : |
| Publisher | : |
| Total Pages | : |
| Release | : 1905 |
| Genre | : |
| ISBN | : |
The purpose of this research has been to develop an optimum process for the borondoping of implants and polysilicon gates of metal-oxide-semiconductor (MOS) devices. An experimental design was constructed to determine the effects of diffusiontemperature, time, and ambient on characteristics of the doping process. A temperaturerange of 800 to 1000 degrees Celsius was studied with a diffusion time between 10 and 60 minutes. Two diffusion ambients were used for doping processes, a pure nitrogenambient and a nitrogen-oxygen gaseous mixture. Device wafers were fabricated, and thetesting of MOS capacitors and van der Pauw test structures was performed to determinethe effect of diffusion conditions on flatband voltage and poly gate doping. Materialscharacterization techniques were used on monitor wafers for each diffusion process todetermine the wafer structure formed for each process and evaluate the effectiveness ofthe deglaze etch. The processes that resulted in the best device characteristics withoutsuffering from significant poly depletion effects and flatband voltage shifts were wafersdoped at 800 degrees Celsius in a pure nitrogen atmosphere for 20 minutes and 45 minutes. The presence of oxygen in the atmosphere caused the depletion of boron fromthe Si wafer surface. The formation of the Si-B phase only occurred on devices processedat 1000 degrees Celsius. The deglaze process used in this experiment did not fully remove this layer, and thus all devices doped at this temperature were seriously degraded.
| Author | : J.J. Pouch |
| Publisher | : Trans Tech Publications Ltd |
| Total Pages | : 426 |
| Release | : 1991-01-01 |
| Genre | : Technology & Engineering |
| ISBN | : 3035704511 |
Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition.
| Author | : Dennis N. Schmidt |
| Publisher | : The Electrochemical Society |
| Total Pages | : 454 |
| Release | : 1994 |
| Genre | : Technology & Engineering |
| ISBN | : 9781566770415 |
| Author | : |
| Publisher | : |
| Total Pages | : 300 |
| Release | : 1968 |
| Genre | : Ceramic metals |
| ISBN | : |
Abstracts dealing with combination of ceramic materials with metals, selected from Ceramic abstracts.
| Author | : Walter Maranon |
| Publisher | : |
| Total Pages | : 69 |
| Release | : 2007 |
| Genre | : Boron nitride |
| ISBN | : |
