Body Effect Of Amorphous In Ga Zn O Thin Film Transistor And Its Application On Visible Detection And Threshold Voltage Modulation PDF Download

Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Body Effect Of Amorphous In Ga Zn O Thin Film Transistor And Its Application On Visible Detection And Threshold Voltage Modulation PDF full book. Access full book title Body Effect Of Amorphous In Ga Zn O Thin Film Transistor And Its Application On Visible Detection And Threshold Voltage Modulation.

Introduction to Thin Film Transistors

Introduction to Thin Film Transistors
Author: S.D. Brotherton
Publisher: Springer Science & Business Media
Total Pages: 467
Release: 2013-04-16
Genre: Technology & Engineering
ISBN: 3319000020

Download Introduction to Thin Film Transistors Book in PDF, ePub and Kindle

Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.


Oxide Semiconductors: Volume 1633

Oxide Semiconductors: Volume 1633
Author: Steve Durbin
Publisher: Materials Research Society
Total Pages: 0
Release: 2014-07-14
Genre: Technology & Engineering
ISBN: 9781605116105

Download Oxide Semiconductors: Volume 1633 Book in PDF, ePub and Kindle

Symposium R, "Oxide Semiconductors" was held December 1-6 at the 2013 MRS Fall Meeting in Boston, Massachusetts. Oxide semiconductors are poised to take a more active role in modern electronics, particularly in the field of thin film transistors. While many advances have been made in terms of our understanding of fundamental optical and electronic characteristics, there remain many questions in terms of defects, doping, and optimal growth/synthesis conditions. This symposium proceedings volume represents recent advances in growth and characterization of a number of different oxide semiconductors, as well as device fabrication.


Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors, Non-volatile Memory and Circuits for Transparent Electronics

Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors, Non-volatile Memory and Circuits for Transparent Electronics
Author:
Publisher:
Total Pages:
Release: 2006
Genre:
ISBN:

Download Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors, Non-volatile Memory and Circuits for Transparent Electronics Book in PDF, ePub and Kindle

The ability to make electronic devices, that are transparent to visible and near infrared wavelength, is a relatively new field of research in the development of the next generation of optoelectronic devices. A new class of inorganic thin-film transistor (TFT) channel material based on amorphous oxide semiconductors, that show high carrier mobility and high visual transparency, is being researched actively. The purpose of this dissertation is to develop amorphous oxide semiconductors by pulsed laser deposition, show their suitability for TFT applications and demonstrate other classes of devices such as non-volatile memory elements and integrated circuits such as ring oscillators and active matrix pixel elements. Indium gallium zinc oxide (IGZO) is discussed extensively in this dissertation. The influence of several deposition parameters is explored and oxygen partial pressure during deposition is found to have a profound effect on the electrical and optical characteristics of the IGZO films. By optimizing the deposition conditions, IGZO TFTs exhibit excellent electrical properties, even without any intentional annealing. This attribute along with the amorphous nature of the material also makes IGZO TFTs compatible with flexible substrates opening up various applications. IGZO TFTs with saturation field effect mobility of 12 â€" 16 cm2 V-1 s-1 and subthreshold voltage swing of 200 mV decade-1 have been fabricated. By varying the oxygen partial pressure during deposition the conductivity of the channel was controlled to give a low off-state current ~ 10 pA and a drain current on/off ratio of 1 x108. Additionally, the effects of the oxygen partial pressure and the thickness of the semiconductor layer, the choice of the gate dielectric material and the device channel length on the electrical characteristics of the TFTs are explored. To evaluate IGZO TFT electrical stability, constant voltage bias stress measurements were carried out. The observed logarithmic depende.


Concise Modeling of Amorphous Dual-Gate In-Ga-Zn-O Thin-Film Transistors for Integrated Circuit Designs *Supported by the National Key Research and Development Program of China Under Grant No 2017YFA0204600, the National Natural Science Foundation of China Under Grant No 61404002, and the Science and Technology Project of Hunan Province Under Grant No 2015JC3041

Concise Modeling of Amorphous Dual-Gate In-Ga-Zn-O Thin-Film Transistors for Integrated Circuit Designs *Supported by the National Key Research and Development Program of China Under Grant No 2017YFA0204600, the National Natural Science Foundation of China Under Grant No 61404002, and the Science and Technology Project of Hunan Province Under Grant No 2015JC3041
Author:
Publisher:
Total Pages:
Release: 2018
Genre:
ISBN:

Download Concise Modeling of Amorphous Dual-Gate In-Ga-Zn-O Thin-Film Transistors for Integrated Circuit Designs *Supported by the National Key Research and Development Program of China Under Grant No 2017YFA0204600, the National Natural Science Foundation of China Under Grant No 61404002, and the Science and Technology Project of Hunan Province Under Grant No 2015JC3041 Book in PDF, ePub and Kindle

Abstract : An analytical model for current–voltage behavior of amorphous In-Ga-Zn-O thin-film transistors (a-IGZO TFTs) with dual-gate structures is developed. The unified expressions for synchronous and asynchronous operating modes are derived on the basis of channel charges, which are controlled by gate voltage. It is proven that the threshold voltage of asynchronous dual-gate IGZO TFTs is adjusted in proportion to the ratio of top insulating capacitance to the bottom insulating capacitance (CTI /CBI ). Incorporating the proposed model with Verilog-A, a touch-sensing circuit using dual-gate structure is investigated by SPICE simulations. Comparison shows that the touch sensitivity is increased by the dual-gate IGZO TFT structure .


Investigation of Ultra-thin In-Ga-Zn-O Thin-film Transistors

Investigation of Ultra-thin In-Ga-Zn-O Thin-film Transistors
Author: Tsung-Han Chiang
Publisher:
Total Pages: 63
Release: 2015
Genre: Indium gallium zinc oxide
ISBN:

Download Investigation of Ultra-thin In-Ga-Zn-O Thin-film Transistors Book in PDF, ePub and Kindle

The objective of the work reported herein is to explore the impact of decreasing channel thickness on radio-frequency (RF) sputtered amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) electrical performance through the evaluation of drain current versus gate voltage (I[subscript D] - V[subscript G]) transfer curves. For a fixed set of process parameters, it is found that the turn-on voltage, V[subscript ON] (off drain current, I[superscript OFF][subscript D]) increases (decreases) with decreasing a-IGZO channel thickness (h) for h


On the Reversible Effects of Bias-stress Applied to Amorphous Indium-gallium-zinc-oxide Thin Film Transistors

On the Reversible Effects of Bias-stress Applied to Amorphous Indium-gallium-zinc-oxide Thin Film Transistors
Author: Anish Suresh Bharadwaj
Publisher:
Total Pages: 52
Release: 2018
Genre: Thin film transistors
ISBN:

Download On the Reversible Effects of Bias-stress Applied to Amorphous Indium-gallium-zinc-oxide Thin Film Transistors Book in PDF, ePub and Kindle

"The role of amorphous IGZO (Indium Gallium Zinc Oxide) in Thin Film Transistors (TFT) has found its application in emerging display technologies such as active matrix liquid crystal display (LCD) and active matrix organic light-emitting diode (AMOLED) due to factors such as high mobility 10-20 cm2/(V.s), low subthreshold swing (~120mV/dec), overall material stability and ease of fabrication. However, prolonged application of gate bias on the TFT results in deterioration of I-V characteristics such as sub-threshold distortion and a distinct shift in threshold voltage. Both positive-bias and negative-bias affects have been investigated. In most cases positive-stress was found to have negligible influence on device characteristics, however a stress induced trap state was evident in certain cases. Negative stress demonstrated a pronounced influence by donor like interface traps, with significant transfer characteristics shift that was reversible over a period of time at room temperature. It was also found that the reversible mechanism to pre-stress conditions was accelerated when samples were subjected to cryogenic temperature (77 K). To improve device performance BG devices were subjected to extended anneals and encapsulated with ALD alumina. These devices were found to have excellent resistance to bias stress. Double gate devices that were subjected to extended anneals and alumina capping revealed similar results with better electrostatics compared to BG devices. The cause and effect of bias stress and its reversible mechanisms on IGZO TFTs has been studied and explained with supporting models."--Abstract.