Atmosphere Influence On In Situ Ion Beam Analysis Of Thin Film Growth PDF Download
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Total Pages | : 23 |
Release | : 1994 |
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Download Atmosphere Influence on in Situ Ion Beam Analysis of Thin Film Growth Book in PDF, ePub and Kindle
In situ, nondestructive surface characterization of thin-film growth processes in an environment of chemically active gas at pressures of several mTorr is required both for the understanding of growth processes in multicomponent films and layered heterostructures and for the improvement of process reproducibility and device reliability. The authors have developed a differentially pumped pulsed ion beam surface analysis system that includes ion scattering spectroscopy (ISS) and direct recoil spectroscopy (DRS), coupled to an automated ion beam sputter-deposition system (IBSD), to study film growth processes in an environment of chemically active gas, such as required for the growth of oxide, nitride, or diamond thin films. The influence of gas-phase scattering and gas-surface interactions on the ISS and DRS signal intensity and peak shape have been studied. From the intensity variation as a function of ambient gas pressure, the authors have calculated the mean free path and the scattering cross-section for a given combination of primary ion species and ambient gas. Depending on the system geometry and the combination of primary beam and background, it is shown that surface-specific data can be obtained during thin-film growth at pressures ranging from a few mtorr to approximately 1 Torr. Detailed information such as surface composition, structure, and film growth mechanism may be obtained in real-time, making ion beam analysis an ideal nondestructive, in situ probe of thin-film growth processes.
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Total Pages | : 704 |
Release | : 1995 |
Genre | : Aeronautics |
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Download Scientific and Technical Aerospace Reports Book in PDF, ePub and Kindle
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Total Pages | : 29 |
Release | : 1995 |
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Download In Situ Analysis of Thin Film Deposition Processes Using Time-of-flight (TOF) Ion Beam Analysis Methods Book in PDF, ePub and Kindle
Non-destructive, in situ methods for characterization of thin film growth phenomena is key to understand thin film growth processes and to develop more reliable deposition procedures, especially for complex layered structures involving multi-phase materials. However, surface characterization methods that use either electrons (e.g. AES or XPS) or low energy ions (SIMS) require an UHV environment and utilize instrumentation which obstructs line of sight access to the substrate and are therefore incompatible with line of sight deposition methods and thin film deposition processes which introduce gas, either part of the deposition or in order to produce the desired phase. We have developed a means of differentially pumping both the ion beam source and detectors of a TOF ion beam surface analysis spectrometer that does not interfere with the deposition process and permits compositional and structural analysis of the growing film in the present system, at pressures up to several mTorr. Higher pressures are feasible with modified source-detector geometry. In order to quantify the sensitivity of Ion Scattering Spectroscopy (ISS) and Direct Recoil Spectroscopy (DRS), we have measured the signal intensity for stabilized clean metals in a variety of gas environments as a function of the ambient gas species and pressure, and ion beam species and kinetic energy. Results are interpreted in terms of collision cross sections which are compared with known gas phase scattering data and provide an apriori basis for the evaluation of time-of-flight ion scattering and recoil spectroscopies (ToF-ISARS) for various industrial processing environments which involve both inert and reactive cases. The cross section data for primary ion-gas molecule and recoiled atom-gas molecule interactions are also provided. from which the maximum operating pressure in any experimental configuration can be obtained.
Author | : K. H. J. Buschow |
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Total Pages | : 1008 |
Release | : 2001 |
Genre | : Materials |
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Download Encyclopedia of Materials Book in PDF, ePub and Kindle
Accompanyind CR-ROM conrtains The Encyclopedia of Materials Science and Technology on a web access disc.
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Total Pages | : 868 |
Release | : 1995 |
Genre | : Science |
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Download Government Reports Announcements & Index Book in PDF, ePub and Kindle
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Total Pages | : 1042 |
Release | : 1998 |
Genre | : Metallurgy |
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Download Metals Abstracts Book in PDF, ePub and Kindle
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Total Pages | : 1622 |
Release | : 1996 |
Genre | : Metallurgy |
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Download Metals Abstracts Index Book in PDF, ePub and Kindle
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Total Pages | : 536 |
Release | : 1990 |
Genre | : Power resources |
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Download Energy Research Abstracts Book in PDF, ePub and Kindle
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Total Pages | : 564 |
Release | : 1994 |
Genre | : Corrosion and anti-corrosives |
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Download Metallurgical Coatings and Thin Films 1994 Book in PDF, ePub and Kindle
Author | : Agustin Gonzalez-elipe |
Publisher | : World Scientific |
Total Pages | : 299 |
Release | : 2003-03-21 |
Genre | : Science |
ISBN | : 1783261048 |
Download Low Energy Ion Assisted Film Growth Book in PDF, ePub and Kindle
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.