Optical Microlithography
Author | : |
Publisher | : |
Total Pages | : 674 |
Release | : 2007 |
Genre | : Integrated circuits |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 674 |
Release | : 2007 |
Genre | : Integrated circuits |
ISBN | : |
Author | : Chris Mack |
Publisher | : John Wiley & Sons |
Total Pages | : 503 |
Release | : 2011-08-10 |
Genre | : Technology & Engineering |
ISBN | : 1119965071 |
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author | : Bruce W. Smith |
Publisher | : CRC Press |
Total Pages | : 864 |
Release | : 2018-10-03 |
Genre | : Technology & Engineering |
ISBN | : 1420051539 |
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author | : Harry L. Stover |
Publisher | : |
Total Pages | : 284 |
Release | : 1982 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : P. Rai-Choudhury |
Publisher | : IET |
Total Pages | : 784 |
Release | : 1997 |
Genre | : Technology & Engineering |
ISBN | : 9780852969069 |
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author | : Alfred Kwok-Kit Wong |
Publisher | : SPIE Press |
Total Pages | : 280 |
Release | : 2005 |
Genre | : Technology & Engineering |
ISBN | : 9780819458292 |
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author | : Bruce W. Smith |
Publisher | : SPIE-International Society for Optical Engineering |
Total Pages | : 650 |
Release | : 2004 |
Genre | : Technology & Engineering |
ISBN | : |
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author | : Society of Photo-optical Instrumentation Engineers |
Publisher | : |
Total Pages | : 304 |
Release | : 1987 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : Luc Van den Hove |
Publisher | : SPIE-International Society for Optical Engineering |
Total Pages | : 1114 |
Release | : 1998 |
Genre | : Science |
ISBN | : |
A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Author | : Harry L. Stover |
Publisher | : |
Total Pages | : 288 |
Release | : 1984 |
Genre | : Science |
ISBN | : |