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| Author | : Koji Sugioka |
| Publisher | : MDPI |
| Total Pages | : 155 |
| Release | : 2018-12-07 |
| Genre | : Electronic books |
| ISBN | : 3038974102 |
This book is a printed edition of the Special Issue "Laser-Based Nano Fabrication and Nano Lithography" that was published in Nanomaterials
| Author | : Ya Cheng |
| Publisher | : |
| Total Pages | : |
| Release | : 2018 |
| Genre | : |
| ISBN | : 9783038974116 |
The improvement of fabrication resolutions is an eternal challenge for miniaturizing and enhancing the integration degrees of devices. Laser processing is one of the most widely used techniques in manufacturing due to its high flexibility, high speed, and environmental friendliness. The fabrication resolution of laser processing is, however, limited by the diffraction limit. Recently, much effort has been made to overcome the diffraction limit in nano fabrication. Specifically, combinations of multiphoton absorption by ultrafast lasers and the threshold effect associated with a Gaussian beam profile provide fabrication resolutions far beyond the diffraction limit. The use of the optical near-field achieves nano ablation with feature sizes below 100 nm. Multiple pulse irradiation from the linearly polarized ultrafast laser produces periodic nanostructures with a spatial period much smaller than the wavelength. Unlimited diffraction resolutions can also be achieved with shaped laser beams. In the meanwhile, lasers are also widely used for the synthesis of nano materials including fullerenes and nano particles. In view of the rapid advancement of this field in recent years, this Special Issue aims to introduce the state-of-the-art in nano fabrication and nano lithography, based on laser technologies, by leading groups in the field.
| Author | : Ampere A. Tseng |
| Publisher | : World Scientific |
| Total Pages | : 583 |
| Release | : 2008 |
| Genre | : Science |
| ISBN | : 9812700765 |
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
| Author | : Qian Liu |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 274 |
| Release | : 2013-10-29 |
| Genre | : Technology & Engineering |
| ISBN | : 3642403875 |
Novel Optical Technologies for Nanofabrication describes recent advances made in micro/nanofabrication with super-resolution laser technologies, which are based on the latest research findings in the authors’ groups. It focuses on new techniques and methods as well as applications and development trends in laser nanofabrication, including super-resolution laser direct writing, surface structures composed of laser path-guided wrinkle, three-dimensional laser nanofabrication based on two-photon absorption, and nanofabrication by laser interference and surface plasmon polaritons. This book serves as a reference for academic researchers, engineers, technical professionals and graduate students in the fields of micro/nanotechnology, thin film materials, super-resolution optics and laser techniques. Qian Liu is a Professor at Laboratory for Nanodevice, National Center for Nanoscience and Technology, China. Xuanming Duan is a Professor at the Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, China Changsi Peng is a Professor at the Institute of Information Optical Engineering, Soochow University, China.
| Author | : José María de Teresa |
| Publisher | : |
| Total Pages | : 0 |
| Release | : 2020 |
| Genre | : Nanolithography |
| ISBN | : 9780750326087 |
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
| Author | : Anming Hu |
| Publisher | : Springer Nature |
| Total Pages | : 360 |
| Release | : 2020-11-28 |
| Genre | : Science |
| ISBN | : 3030593134 |
This book provides a comprehensive overview of the latest advances in laser techniques for micro-nano-manufacturing and an in-depth analysis of applications, such as 3D printing and nanojoining. Lasers have gained increasing significance as a precise tool for advanced manufacturing. Written by world leading scientists, the first part of the book presents the fundamentals of laser interaction with materials at the micro- and nanoscale, including multiphoton excitation and nonthermal melting, and allows readers to better understand advanced processing. In the second part, the authors focus on various advanced fabrications, such as laser peening, surface nanoengineering, and plasmonic heating. Finally, case studies are devoted to special applications, such as 3D printing, microfluidics devices, energy devices, and plasmonic and photonic waveguides. This book integrates both theoretical and experimental analysis. The combination of tutorial chapters and concentrated case studies will be critically attractive to undergraduate and graduate students, researchers, and engineers in the relevant fields. Readers will grasp the full picture of the application of laser for micro-nanomanufacturing and 3D printing.
| Author | : M Feldman |
| Publisher | : Woodhead Publishing |
| Total Pages | : 599 |
| Release | : 2014-02-13 |
| Genre | : Technology & Engineering |
| ISBN | : 0857098756 |
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
| Author | : Maria Stepanova |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 344 |
| Release | : 2011-11-08 |
| Genre | : Technology & Engineering |
| ISBN | : 3709104246 |
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
| Author | : Bo Cui |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 630 |
| Release | : 2011-12-02 |
| Genre | : Science |
| ISBN | : 953307602X |
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
| Author | : Stefan Landis |
| Publisher | : John Wiley & Sons |
| Total Pages | : 424 |
| Release | : 2013-03-04 |
| Genre | : Technology & Engineering |
| ISBN | : 1118621700 |
Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields. Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS). This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.
