Ion Sources For Surface Treatments Of Materials Final Report On The Contract 0248u0016 35 Between The Los Alamos National Laboratory And The Institute Of Electrophysics PDF Download
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| Total Pages | : 6 |
| Release | : 1998 |
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Download Ion Sources for Surface Treatments of Materials . Final Report on the Contract 0248U0016-35 Between the Los Alamos National Laboratory and the Institute of Electrophysics Book in PDF, ePub and Kindle
Treatment of materials by accelerated ions causes considerable changes in the microstructure and properties of the surface layer of these materials. Results of numerous laboratory studies show that ion beams are highly efficient in surface modification of materials. However, development and commercial use of ion beam technologies is hampered due to the lack of inexpensive, reliable and efficient ion sources. One of the promising directions in development of commercial ion sources is the use of cold-cathode discharges for producing ion emitting plasma. The main objectives of the contract works were as follows: (1) analyze discharge characteristics in the electrode system of the inverted magnetron type, parameter and emission properties of the discharge plasma, and formation of broad beams in an ion optics system; (2) create a laboratory prototype ion source, deliver the prototype ion source to Los Alamos, and perform joint experiments on ion beam surface modification of materials; (3) use results of the investigations and tests of the laboratory ion source as the basis for development of a commercial ion source with the beam up to 1,000 cm2 in cross-section area. Results of the research are summarized.
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| Release | : 2006 |
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Download Ion Beam and Plasma Technology Development for Surface Modification at Los Alamos National Laboratory Book in PDF, ePub and Kindle
We are developing two high-throughput technologies for materials modification. The first is a repetitive intense ion beam source for materials modification through rapid surface melt and resolidification (up to 10[sup 10] deg/sec cooling rates) and for ablative deposition of coatings. The short range of the ions (typically 0.1 to 5 micrometers) allows vaporization or melting at moderate beam energy density (typically 1-50 J/cm[sup 2]). A new repetitive intense ion beam accelerator called CHAMP is under development at Los Alamos. The design beam parameters are: E=200 keV, I=15 kA, [tau]=1 [micro]s, and 1 Hz. This accelerator will enable applications such as film deposition, alloying and mixing, cleaning and polishing, corrosion and wear resistance, polymer surface treatments, and nanophase powder synthesis. The second technology is plasma source ion implantation (PSII) using plasmas generated from both gas phase (using radio frequency excitation) and solid phase (using a cathodic arc) sources. We have used PSII to directly implant ions for surface modification or as method for generating graded interfaces to enhance the adhesion of surface coatings. Surfaces with areas of up to 16 m[sup 2] and weighing more than a thousand kilograms have been treated in the Los Alamos PSII chamber. In addition, PSII in combination with cathodic source deposition has been used to form highly adherent, thick Er[sub 2]O[sub 3] coatings on steel for reactive metal containment in casting. These coatings resist delamination under extreme mechanical and thermal stress.
