Interfacial Forces In Chemical Mechanical Polishing Cmp PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Interfacial Forces In Chemical Mechanical Polishing Cmp PDF full book. Access full book title Interfacial Forces In Chemical Mechanical Polishing Cmp.
Author | : Dedy Ng |
Publisher | : |
Total Pages | : |
Release | : 2010 |
Genre | : |
ISBN | : |
Download Interfacial Forces in Chemical-mechanical Polishing (CMP) Book in PDF, ePub and Kindle
The demand for microelectronic device miniaturization requires new concepts and technology improvement in the integrated circuits fabrication. In last two decades, Chemical-Mechanical Polishing (CMP) has emerged as the process of choice for planarization. The process takes place at the interface of a substrate, a polishing pad, and an abrasive containing slurry. This synergetic process involves several forces in multi-length scales and multi-mechanisms. This research contributes fundamental understanding of surface and interface sciences of microelectronic materials with three major objectives. In order to extend the industrial impact of this research, the chemical-mechanical polishing (CMP) is used as a model system for this study. The first objective of this research is to investigate the interfacial forces in the CMP system. For the first time, the interfacial forces are discussed systematically and comparatively so that key forces in CMP can be pinpointed. The second objective of this research is to understand the basic principles of lubrication, i.e., fluid drag force that can be used to monitor, evaluate, and optimize CMP processes. New parameters were introduced to include the change of material properties during CMP. Using the experimental results, a new equation was developed to understand the principle of lubrication behind the CMP. The third objective is to study the synergy of those interfacial forces with electrochemistry. The electro-chemical-mechanical polishing (ECMP) of copper was studied. Experiments were conducted on the tribometer in combination with a potentiostat. Friction coefficient was used to monitor the polishing process and correlated with the wear behavior of post-CMP samples. Surface characterization was performed using AFM, SEM, and XPS techniques. Results from experiments were used to generate a new wear model, which provided insight from CMP mechanisms. The ECMP is currently the newest technique used in the semiconductor industries. This research is expected to contribute to the CMP technology and improve its process performance. This dissertation consists of six chapters. The first chapter covers the introduction and background information of surface forces and CMP. The motivation and objectives are discussed in the second chapter. The three major objectives which include approaches and expected results are covered in the next three chapters. Finally chapter VI summarizes the major discovery in this research and provides some recommendations for future work.
Author | : Wonseop Choi |
Publisher | : |
Total Pages | : 324 |
Release | : 2003 |
Genre | : |
ISBN | : |
Download Study of Interfacial Interaction During Chemical Mechanical Polishing (cmp) of Dielectric Silicon Dioxide Book in PDF, ePub and Kindle
Author | : R. Rhoades |
Publisher | : The Electrochemical Society |
Total Pages | : 93 |
Release | : 2016-09-21 |
Genre | : Science |
ISBN | : 1607687453 |
Download Chemical Mechanical Polishing 14 Book in PDF, ePub and Kindle
Author | : Mingjie Zhong |
Publisher | : |
Total Pages | : 350 |
Release | : 2013 |
Genre | : Chemical mechanical planarization |
ISBN | : |
Download Interfacial Chemistry in Chemical Mechanical Planarization (CMP) and Post-CMP Cleaning of Surfaces for Microelestronic Applications Book in PDF, ePub and Kindle
Author | : S. V. Babu |
Publisher | : |
Total Pages | : 304 |
Release | : 2000-02-10 |
Genre | : Technology & Engineering |
ISBN | : |
Download Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 Book in PDF, ePub and Kindle
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author | : |
Publisher | : |
Total Pages | : 184 |
Release | : 2000 |
Genre | : Electrolytic polishing |
ISBN | : |
Download Chemical-mechanical Polishing Book in PDF, ePub and Kindle
Author | : Yongsik Moon |
Publisher | : |
Total Pages | : 436 |
Release | : 1999 |
Genre | : |
ISBN | : |
Download Mechanical Aspects of the Material Removal Mechanism in Chemical Mechanical Polishing (CMP) Book in PDF, ePub and Kindle
Author | : Hans-Jürgen Butt |
Publisher | : John Wiley & Sons |
Total Pages | : 605 |
Release | : 2018-04-03 |
Genre | : Science |
ISBN | : 3527804366 |
Download Surface and Interfacial Forces Book in PDF, ePub and Kindle
A general introduction to surface and interfacial forces, perfectly combining theoretical concepts, experimental techniques and practical applications. In this completely updated edition all the chapters have been thoroughly revised and extended to cover new developments and approaches with around 15% new content. A large part of the book is devoted to surface forces between solid surfaces in liquid media, and while a basic knowledge of colloid and interface science is helpful, it is not essential since all important concepts are explained and the theoretical concepts can be understood with an intermediate knowledge of mathematics. A number of exercises with solutions and the end-of-chapter summaries of the most important equations, facts and phenomena serve as additional tools to strengthen the acquired knowledge and allow for self-study. The result is a readily accessible text that helps to foster an understanding of the intricacies of this highly relevant topic.
Author | : Carel J. van Oss |
Publisher | : CRC Press |
Total Pages | : 459 |
Release | : 2006-05-22 |
Genre | : Science |
ISBN | : 1420015761 |
Download Interfacial Forces in Aqueous Media Book in PDF, ePub and Kindle
Thoroughly revised and reorganized, the second edition of Interfacial Forces in Aqueous Media examines the role of polar interfacial and noncovalent interactions among biological and nonbiological macromolecules as well as biopolymers, particles, surfaces, cells, and both polar and apolar polymers. The book encompasses Lifshitz-van de
Author | : Sudipta Seal |
Publisher | : The Electrochemical Society |
Total Pages | : 370 |
Release | : 2003 |
Genre | : Technology & Engineering |
ISBN | : 9781566774048 |
Download Chemical Mechanical Planarization VI Book in PDF, ePub and Kindle