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| Author | : Jeannette Benavides |
| Publisher | : |
| Total Pages | : 20 |
| Release | : 1997 |
| Genre | : Thin films |
| ISBN | : |
| Author | : |
| Publisher | : |
| Total Pages | : 0 |
| Release | : 2001 |
| Genre | : |
| ISBN | : |
A method for the in-situ measurement of thin-film growth by x-ray reflectivity is described. Description of the underlying theory is given. Real-time characterization of thickness and roughness variation during growth is possible via this technique. A deposition chamber for the implementation of these measurements has been designed and constructed. This apparatus is described, along with software developed for the purpose of data acquisition and analysis.
| Author | : Jean Daillant |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 347 |
| Release | : 2003-07-01 |
| Genre | : Science |
| ISBN | : 3540486968 |
The reflection of and neutrons from surfaces has existed as an x-rays exp- imental for almost it is in the last technique fifty Nevertheless, only years. decade that these methods have become as of enormously popular probes This the surfaces and interfaces. to be due to of several appears convergence of intense different circumstances. These include the more n- availability be measured orders tron and sources that can over (so reflectivity x-ray many of and the much weaker surface diffuse can now also be magnitude scattering of thin films and studied in some the detail); growing importance multil- basic the realization of the ers in both and technology research; important which in the of surfaces and and role roughness plays properties interfaces; the of statistical models to characterize the of finally development topology its and its characterization from on roughness, dependence growth processes The of and to surface scattering experiments. ability x-rays neutro4s study four five orders of in scale of surfaces over to magnitude length regardless their and also their to ability probe environment, temperature, pressure, etc. , makes these the choice for buried interfaces often probes preferred obtaining information about the microstructure of often in statistical a global surfaces, the local This is manner to complementary imaging microscopy techniques, of such studies in the literature witnessed the veritable by explosion published the last few Thus these lectures will useful for over a resource years.
| Author | : British Standards Institute Staff |
| Publisher | : |
| Total Pages | : 42 |
| Release | : 1913-03-31 |
| Genre | : |
| ISBN | : 9780580730160 |
X-rays, X-ray analysis, X-ray apparatus, Instruments, Thickness measurement, Density measurement
| Author | : Bertram Schwartz |
| Publisher | : |
| Total Pages | : 376 |
| Release | : 1967 |
| Genre | : Metallic films |
| ISBN | : |
| Author | : Harland G. Tompkins |
| Publisher | : Momentum Press |
| Total Pages | : 138 |
| Release | : 2015-12-16 |
| Genre | : Technology & Engineering |
| ISBN | : 1606507281 |
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
| Author | : E. M. Murt |
| Publisher | : |
| Total Pages | : 216 |
| Release | : 1969 |
| Genre | : Electron probe microanalysis |
| ISBN | : |
| Author | : Orlando Auciello |
| Publisher | : John Wiley & Sons |
| Total Pages | : 282 |
| Release | : 2001 |
| Genre | : Science |
| ISBN | : 9780471241416 |
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application
| Author | : Bernard D. Cullity |
| Publisher | : Pearson |
| Total Pages | : 656 |
| Release | : 2013-11-01 |
| Genre | : X-ray crystallography |
| ISBN | : 9781292040547 |
Designed for Junior/Senior undergraduate courses. This revision of a classical text is intended to acquaint the reader, who has no prior knowledge of the subject, with the theory of x-ray diffraction, the experimental methods involved, and the main applications. The text is a collection of principles and methods designed directly for the student and not a reference tool for the advanced reader
| Author | : |
| Publisher | : |
| Total Pages | : 17 |
| Release | : 1993 |
| Genre | : |
| ISBN | : |
X-ray reflectivity using energy dispersive X-ray detection has been used to investigate vacuum deposited thin films. A resolution of 0.3 nm for thickness in the range of 3--200 nm and of 0.05 nm for roughness in the range of 0.1--3 nm has been demonstrated. Further, it is shown that by using energy dispersive detection, spectra can be obtained in less than 500 s allowing real time studies to be performed. Thin, discrete Cr/Al deposits on quartz substrates have been investigated and the presence of a 1.5 nm thick Al/Cr intermetallic layer formed during room temperature deposition has been determined. During annealing at 250 C, the Cr layer thickness decreases linearly with time until approximately 4 nm is consumed in additional intermetallic formation; further annealing does not change the Cr layer thickness.
