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Copper Area Selective Atomic Layer Deposition for Plasmonic Metallic Nanostructures

Copper Area Selective Atomic Layer Deposition for Plasmonic Metallic Nanostructures
Author: Chengwu Zhang
Publisher:
Total Pages: 0
Release: 2021
Genre:
ISBN:
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Plasmonics, a flourishing emergent science and technology, is about the interactions between electromagnetic radiation and electrons at metallic nanoparticles. It opens a new pathway for controlling chemical reactions on metallic nanostructures. Plasmonic dimers, especially with sub-10 nm nanogaps, can greatly enhance local electric field intensity through excitations of surface plasmons, which are collective oscillations of electrons excited by light. Previous studies to fabricate plasmonic dimers with sub-10 nm nanogaps include techniques such as electromigration, electroless gold plating, self-assembly, and high resolution electron beam lithography. However, these methods are limited either in pattern design or low yield for scaling up. To attain more flexibility and reliability in fabrication, there is a need for scalable methods to fabricate plasmonic dimers with sub-10 nm nanogaps, which is crucial for their use in practical applications. Atomic layer deposition (ALD) is a thin-film deposition technique capable of producing conformal thin films with precise control of thickness and composition at the atomic level. Area-selective ALD (AS-ALD) is a bottom-up process for direct deposition of materials only on desired regions of a substrate. In this study, we have explored incident light excitations and plasmonic resonances matching to achieve localized surface plasmon resonances (LSPRs) in the area-selective atomic layer deposition (AS-ALD) process. We have applied copper AS-ALD to tune gap sizes of layered and mixed plasmonic dimer arrays and electrically connected dipole-line arrays to sub-10 nm. Results demonstrate that AS-ALD is a reliable and flexible method to achieve sub-10 nm gaps on large area arrays.

Selectivity and Nucleation Effects in Atomic Layer Deposition of Copper for Plasmonic Nanostructures

Selectivity and Nucleation Effects in Atomic Layer Deposition of Copper for Plasmonic Nanostructures
Author: Jie Qi
Publisher:
Total Pages:
Release: 2017
Genre: Electronic dissertations
ISBN:
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As device requirements keep pushing toward smaller and higher aspect ratio structures, atomic layer deposition (ALD) has become a promising technique for the deposition of nanometer dielectric and metallic thin films with applications in semiconductors, nanotechnology, catalysis, and energy. Meanwhile, the field of plasmonics has gained attention, driven by a variety of exciting applications including chemical and biological sensors, solar energy harvesting devices, spectroscopy, and photocatalytic conversion. A key feature of nanoscale plasmonic materials is a strong dependence of the plasmon resonance on size, shape, composition, and surroundings of the nanostructures. ALD offers an effective means to tune the morphology, composition, and particle-particle junctions of nanostructures with precise control at an atomic level. However, successful application of ALD to plasmonics requires detailed understanding of selective growth, nucleation process, and their dependence on growth conditions for nanostructures. In this Cu ALD study, we identified optimal process parameters to achieve conformal deposition on nanostructures with good nucleation. A selectivity window was also defined to help establish a set of relations between selective deposition and growth conditions. Furthermore, we demonstrated that the plasmon resonance can be tuned significantly by Cu ALD and provided a deeper understanding of this process for applications such as plasmonic rectenna. It makes a remarkable contribution to process optimization and device design to enable widespread utilization of this technology in photonics and nanoelectronics.

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials
Author: Nicola Pinna
Publisher: John Wiley & Sons
Total Pages: 463
Release: 2012-09-19
Genre: Technology & Engineering
ISBN: 3527639926
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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Nanoporous Gold

Nanoporous Gold
Author: Arne Wittstock
Publisher: Royal Society of Chemistry
Total Pages: 265
Release: 2012-03-28
Genre: Technology & Engineering
ISBN: 184973528X
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High-surface-area materials have recently attracted significant interest due to potential applications in various fields such as electrochemistry and catalysis, gas-phase catalysis, optics, sensors and actuators, energy harvesting and storage. In contrast to classical materials the properties of high-surface-area materials are no longer determined by their bulk, but by their nanoscale architecture. Nanoporous gold (np-Au) represents the fascinating class of mesoporous metals that have been intensively investigated in recent years. The current interest and the increasing number of scientific publications show that np-Au by itself is an outstanding nano-material that justifies a book devoted to all aspects of its properties and applications. The resulting publication is a discussion of this unique nano-material and is an accessible and comprehensive introduction to the field. The book provides a broad, multi-disciplinary platform to learn more about the properties of nanoporous gold from an inter-disciplinary perspective. It starts with an introduction and overview of state-of-the-art applications and techniques characterizing this material and its applications. It then covers the progress in research within the last years. The chapters are in-depth overviews written by the world's leading scientists in the particular field. Each chapter covers one technique or application so that the reader can easily target their favoured topic and will get the latest and state-of-the-art information in the field.

Atomic Layer Deposition

Atomic Layer Deposition
Author: Tommi Kääriäinen
Publisher: John Wiley & Sons
Total Pages: 274
Release: 2013-05-28
Genre: Technology & Engineering
ISBN: 1118062779
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Bimetallic Nanostructures

Bimetallic Nanostructures
Author: Ya-Wen Zhang
Publisher: John Wiley & Sons
Total Pages: 738
Release: 2018-05-16
Genre: Science
ISBN: 1119214629
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Systematically summarizes the current status and recent advances in bimetallic structures, their shape-controlled synthesis, properties, and applications Intensive researches are currently being carried out on bimetallic nanostructures, focusing on a number of fundamental, physical, and chemical questions regarding their synthesis and properties. This book presents a systematic and comprehensive summary of the current status and recent advances in this field, supporting readers in the synthesis of model bimetallic nanoparticles, and the exploration and interpretation of their properties. Bimetallic Nanostructures: Shape-Controlled Synthesis for Catalysis, Plasmonics and Sensing Applications is divided into three parts. Part 1 introduces basic chemical and physical knowledge of bimetallic structures, including fundamentals, computational models, and in situ characterization techniques. Part 2 summarizes recent developments in synthetic methods, characterization, and properties of bimetallic structures from the perspective of morphology effect, including zero-dimensional nanomaterials, one-dimensional nanomaterials, and two-dimensional nanomaterials. Part 3 discusses applications in electrocatalysis, heterogeneous catalysis, plasmonics and sensing. Comprehensive reference for an important multidisciplinary research field Thoroughly summarizes the present state and latest developments in bimetallic structures Helps researchers find optimal synthetic methods and explore new phenomena in surface science and synthetic chemistry of bimetallic nanostructures Bimetallic Nanostructures: Shape-Controlled Synthesis for Catalysis, Plasmonics and Sensing Applications is an excellent source or reference for researchers and advanced students. Academic researchers in nanoscience, nanocatalysis, and surface plasmonics, and those working in industry in areas involving nanotechnology, catalysis and optoelectronics, will find this book of interest.