Atomic Layer Deposition For Semiconductors PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Atomic Layer Deposition For Semiconductors PDF full book. Access full book title Atomic Layer Deposition For Semiconductors.
Author | : Cheol Seong Hwang |
Publisher | : Springer Science & Business Media |
Total Pages | : 266 |
Release | : 2013-10-18 |
Genre | : Science |
ISBN | : 146148054X |
Download Atomic Layer Deposition for Semiconductors Book in PDF, ePub and Kindle
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author | : Cheol Seong Hwang |
Publisher | : Springer |
Total Pages | : 0 |
Release | : 2016-08-23 |
Genre | : Science |
ISBN | : 9781489979438 |
Download Atomic Layer Deposition for Semiconductors Book in PDF, ePub and Kindle
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author | : Thorsten Lill |
Publisher | : John Wiley & Sons |
Total Pages | : 306 |
Release | : 2021-06-28 |
Genre | : Technology & Engineering |
ISBN | : 3527346686 |
Download Atomic Layer Processing Book in PDF, ePub and Kindle
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Author | : Angus Rockett |
Publisher | : Springer Science & Business Media |
Total Pages | : 629 |
Release | : 2007-11-20 |
Genre | : Technology & Engineering |
ISBN | : 0387686509 |
Download The Materials Science of Semiconductors Book in PDF, ePub and Kindle
This book describes semiconductors from a materials science perspective rather than from condensed matter physics or electrical engineering viewpoints. It includes discussion of current approaches to organic materials for electronic devices. It further describes the fundamental aspects of thin film nucleation and growth, and the most common physical and chemical vapor deposition techniques. Examples of the application of the concepts in each chapter to specific problems or situations are included, along with recommended readings and homework problems.
Author | : Tommi Kääriäinen |
Publisher | : John Wiley & Sons |
Total Pages | : 274 |
Release | : 2013-05-28 |
Genre | : Technology & Engineering |
ISBN | : 1118062779 |
Download Atomic Layer Deposition Book in PDF, ePub and Kindle
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Author | : Anthony C. Jones |
Publisher | : John Wiley & Sons |
Total Pages | : 352 |
Release | : 2008-11-20 |
Genre | : Science |
ISBN | : 3527614621 |
Download CVD of Compound Semiconductors Book in PDF, ePub and Kindle
Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. Vapor phase methods used for semiconductor deposition and the materials properties that make the organometallic precursors useful in the electronics industry are discussed for a variety of materials. Topics included: * techniques for compound semiconductor growth * metalorganic precursors for III-V MOVPE * metalorganic precursors for II-VI MOVPE * single-source precursors * chemical beam epitaxy * atomic layer epitaxy Several useful appendixes and a critically selected, up-to-date list of references round off this practical handbook for materials scientists, solid-state and organometallic chemists, and engineers.
Author | : Yongmin Kim |
Publisher | : |
Total Pages | : |
Release | : 2018 |
Genre | : |
ISBN | : |
Download Atomic Layer Deposition for Energy and Ssemiconductor Applications Book in PDF, ePub and Kindle
In this thesis, I contribute to two instrumental sectors in our current society -- semiconductor and energy -- by developing novel materials through advanced nanoscale engineering through atomic layer deposition (ALD). ALD is a deposition technique in vacuum, which can make highly uniform films with a thickness range of 1-100 nm on both 2-D and 3-D structured substrates. ALD chemistries enable the deposition of a wide diversity of materials. Furthermore, performing diverse ALD chemistries in single deposition is possible, leading to fabrication of both homogenous mixtures and heterogeneous structures (e.g. nanolaminate and metal/metal-oxide composite). First, I will discuss about the use of ALD to fabricate barium titanates and silicon nitrides for the applications in key semiconductor components in Chapters 2 and 3. The continuous downscaling of integrated circuits (ICs) necessitates the development of ultrathin oxides and nitrides, mainly used for dielectric materials and sidewall spacers in transistors, respectively. Oxide films with high dielectric constants (i.e. high-k) and low electrical leakage currents are essential for the applications of information storage devices such as dynamic random-access memory (DRAM). Using ALD, ultrathin (
Author | : Andrew Y. C. Nee |
Publisher | : Springer |
Total Pages | : 0 |
Release | : 2014-10-31 |
Genre | : Technology & Engineering |
ISBN | : 9781447146698 |
Download Handbook of Manufacturing Engineering and Technology Book in PDF, ePub and Kindle
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Author | : Shyam P Muraka |
Publisher | : Elsevier |
Total Pages | : 459 |
Release | : 2003-10-13 |
Genre | : Science |
ISBN | : 0080521959 |
Download Interlayer Dielectrics for Semiconductor Technologies Book in PDF, ePub and Kindle
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges. Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package. * Brings together for the FIRST time the science and technology of interlayer deilectrics materials, in one volume * written by renowned experts in the field * Provides an up-to-date starting point in this young research field.
Author | : Julien Bachmann |
Publisher | : John Wiley & Sons |
Total Pages | : 366 |
Release | : 2017-03-15 |
Genre | : Technology & Engineering |
ISBN | : 3527694838 |
Download Atomic Layer Deposition in Energy Conversion Applications Book in PDF, ePub and Kindle
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.