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Advanced Semiconducting Materials and Devices

Advanced Semiconducting Materials and Devices
Author: K.M. Gupta
Publisher: Springer
Total Pages: 595
Release: 2015-08-20
Genre: Technology & Engineering
ISBN: 3319197584

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This book presents the latest developments in semiconducting materials and devices, providing up-to-date information on the science, processes, and applications in the field. A wide range of topics are covered, including optoelectronic devices, metal–semiconductor junctions, heterojunctions, MISFETs, LEDs, semiconductor lasers, photodiodes, switching diodes, tunnel diodes, Gunn diodes, solar cells, varactor diodes, IMPATT diodes, and advanced semiconductors. Detailed attention is paid to advanced and futuristic materials. In addition, clear explanations are provided of, for example, electron theories, high-field effects, the Hall effect, transit-time effects, drift and diffusion, breakdown mechanisms, equilibrium and transient conditions, switching, and biasing. The book is designed to meet the needs of undergraduate engineering students and will also be very useful for postgraduate students; it will assist in preparation for examinations at colleges and universities and for other examinations in engineering. Practice questions are therefore presented in both essay and multiple choice format, and many solved examples and unsolved problems are included.


Semiconductor Material and Device Characterization

Semiconductor Material and Device Characterization
Author: Dieter K. Schroder
Publisher: John Wiley & Sons
Total Pages: 800
Release: 2015-06-29
Genre: Technology & Engineering
ISBN: 0471739065

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This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.


Novel Compound Semiconductor Nanowires

Novel Compound Semiconductor Nanowires
Author: Fumitaro Ishikawa
Publisher: CRC Press
Total Pages: 420
Release: 2017-10-17
Genre: Science
ISBN: 1315340720

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One dimensional electronic materials are expected to be key components owing to their potential applications in nanoscale electronics, optics, energy storage, and biology. Besides, compound semiconductors have been greatly developed as epitaxial growth crystal materials. Molecular beam and metalorganic vapor phase epitaxy approaches are representative techniques achieving 0D–2D quantum well, wire, and dot semiconductor III-V heterostructures with precise structural accuracy with atomic resolution. Based on the background of those epitaxial techniques, high-quality, single-crystalline III-V heterostructures have been achieved. III-V Nanowires have been proposed for the next generation of nanoscale optical and electrical devices such as nanowire light emitting diodes, lasers, photovoltaics, and transistors. Key issues for the realization of those devices involve the superior mobility and optical properties of III-V materials (i.e., nitride-, phosphide-, and arsenide-related heterostructure systems). Further, the developed epitaxial growth technique enables electronic carrier control through the formation of quantum structures and precise doping, which can be introduced into the nanowire system. The growth can extend the functions of the material systems through the introduction of elements with large miscibility gap, or, alternatively, by the formation of hybrid heterostructures between semiconductors and another material systems. This book reviews recent progresses of such novel III-V semiconductor nanowires, covering a wide range of aspects from the epitaxial growth to the device applications. Prospects of such advanced 1D structures for nanoscience and nanotechnology are also discussed.


Advanced Nanoelectronics

Advanced Nanoelectronics
Author: Muhammad Mustafa Hussain
Publisher: John Wiley & Sons
Total Pages: 284
Release: 2019-01-04
Genre: Technology & Engineering
ISBN: 352734358X

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Brings novel insights to a vibrant research area with high application potential?covering materials, physics, architecture, and integration aspects of future generation CMOS electronics technology Over the last four decades we have seen tremendous growth in semiconductor electronics. This growth has been fueled by the matured complementary metal oxide semiconductor (CMOS) technology. This comprehensive book captures the novel device options in CMOS technology that can be realized using non-silicon semiconductors. It discusses germanium, III-V materials, carbon nanotubes and graphene as semiconducting materials for three-dimensional field-effect transistors. It also covers non-conventional materials such as nanowires and nanotubes. Additionally, nanoelectromechanical switches-based mechanical relays and wide bandgap semiconductor-based terahertz electronics are reviewed as essential add-on electronics for enhanced communication and computational capabilities. Advanced Nanoelectronics: Post-Silicon Materials and Devices begins with a discussion of the future of CMOS. It continues with comprehensive chapter coverage of: nanowire field effect transistors; two-dimensional materials for electronic applications; the challenges and breakthroughs of the integration of germanium into modern CMOS; carbon nanotube logic technology; tunnel field effect transistors; energy efficient computing with negative capacitance; spin-based devices for logic, memory and non-Boolean architectures; and terahertz properties and applications of GaN. -Puts forward novel approaches for future, state-of-the-art, nanoelectronic devices -Discusses emerging materials and architectures such as alternate channel material like germanium, gallium nitride, 1D nanowires/tubes, 2D graphene, and other dichalcogenide materials and ferroelectrics -Examines new physics such as spintronics, negative capacitance, quantum computing, and 3D-IC technology -Brings together the latest developments in the field for easy reference -Enables academic and R&D researchers in semiconductors to "think outside the box" and explore beyond silica An important resource for future generation CMOS electronics technology, Advanced Nanoelectronics: Post-Silicon Materials and Devices will appeal to materials scientists, semiconductor physicists, semiconductor industry, and electrical engineers.


Advanced Material and Device Applications with Germanium

Advanced Material and Device Applications with Germanium
Author: Sanghyun Lee
Publisher: BoD – Books on Demand
Total Pages: 102
Release: 2018-10-03
Genre: Science
ISBN: 1789840317

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Germanium is an elemental semiconductor, which played an important role in the birth of the semiconductor but soon was replaced with silicon. However, germanium is poised to make a remarkable comeback in the semiconductor industry. With this increasing attention, this book describes the fundamental aspects of germanium and its applications. The contributing authors are experts in their field with great in-depth knowledge. The authors strongly feel that this contribution might be of interest to readers and help to expand the scope of their knowledge.


Materials for High-Temperature Semiconductor Devices

Materials for High-Temperature Semiconductor Devices
Author: National Research Council
Publisher: National Academies Press
Total Pages: 135
Release: 1995-09-14
Genre: Technology & Engineering
ISBN: 0309176050

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Major benefits to system architecture would result if cooling systems for components could be eliminated without compromising performance. This book surveys the state-of-the-art for the three major wide bandgap materials (silicon carbide, nitrides, and diamond), assesses the national and international efforts to develop these materials, identifies the technical barriers to their development and manufacture, determines the criteria for successfully packaging and integrating these devices into existing systems, and recommends future research priorities.


Advanced Silicon & Semiconducting Silicon-Alloy Based Materials & Devices

Advanced Silicon & Semiconducting Silicon-Alloy Based Materials & Devices
Author: Jo Nijs
Publisher: CRC Press
Total Pages: 490
Release: 2021-05-30
Genre: Science
ISBN: 1000447790

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One of the first books to cover advanced silicon-based technologies, Advanced Silicon and Semiconducting Silicon Alloy-Based Materials and Devices presents important directions for research into silicon, its alloy-based semiconducting devices, and its development in commercial applications. The first section deals with single/mono crystalline silicon, focusing on the effects of heavy doping; the structure and electronic properties of defects and their impact on devices; the MBE of silicon, silicon alloys, and metals; CVD techniques for silicon and silicon germanium; the material properties of silicon germanium strained layers; silicon germanium heterojunction bipolar applications; FETs, IR detectors, and resonant tunneling devices in silicon, silicon germanium, and d-doped silicon; and the fascinating properties of crystalline silicon carbide and its applications. The second section explores polycrystalline silicon. It examines large grain polysilicon substrates for solar cells; the properties, analysis, and modeling of polysilicon TFTs; the technology of polysilicon TFTs in LCD displays; and the use of polycrystalline silicon and its alloys in VLSI applications. With contributors from leading academic and industrial research centers, this book provides wide coverage of fabrication techniques, material properties, and device applications.


Semiconductors

Semiconductors
Author: Martin I. Pech-Canul
Publisher: Springer
Total Pages: 590
Release: 2019-01-17
Genre: Technology & Engineering
ISBN: 3030021718

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This book is a practical guide to optical, optoelectronic, and semiconductor materials and provides an overview of the topic from its fundamentals to cutting-edge processing routes to groundbreaking technologies for the most recent applications. The book details the characterization and properties of these materials. Chemical methods of synthesis are emphasized by the authors throughout the publication. Describes new materials and updates to older materials that exhibit optical, optoelectronic and semiconductor behaviors; Covers the structural and mechanical aspects of the optical, optoelectronic and semiconductor materials for meeting mechanical property and safety requirements; Includes discussion of the environmental and sustainability issues regarding optical, optoelectronic, and semiconductor materials, from processing to recycling.


Computational Study of Advanced Semiconducting Materials for Next-generation Electronic Devices

Computational Study of Advanced Semiconducting Materials for Next-generation Electronic Devices
Author: Jingyang Wang
Publisher:
Total Pages: 294
Release: 2019
Genre:
ISBN:

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The semiconductor industry enabling numerous electronic devices that empower the digital era has arrived at a turning point in recent years. Traditional silicon (Si)-based devices are about to reach the material limit as a result of extreme scaling of gate length below 10nm, leading to the forthcoming end of Moore's law. One of the proposed ways to advance beyond Moore's law is to use alternative, advanced semiconducting materials such as indium gallium arsenide (InGaAs) and gallium oxide (Ga2O3), mainly for their superior electronic properties compared to traditional semiconductors. However, a series of major challenges need to be overcome in order for these materials to live up to their promise, including insufficiently high dopant activation and insufficiently low contact resistivity for InGaAs, and strong degree of dopant segregation towards the surface for Ga2O3. In this thesis, we address these challenges with a computational modeling approach, based on ab initio density functional theory calculations. Our main findings include: (1) formation and binding of negatively-charged cation vacancies are the major contributor of charge compensation in heavily Si-doped InGaAs; (2) composition, surface termination, doping concentration, compositional grading and metal-semiconductor alloying can all affect the contact resistivity of InGaAs; (3) in random InGaAs, vibrational modes associated with shallow n-type dopants (Si, Se) and defects (cation vacancies) assume band-like distribution with many satellite peaks, in contrast with the single-peak signature of the same impurities in binary compounds (GaAs, InAs); and (4) Sn has the strongest tendency to segregate towards the (010) surface of Ga2O3 among three common shallow n-type dopants (Si, Ge, Sn), and the presence of negatively-charged surface Ga vacancies drastically enhance the segregation effect due to Coulomb interaction. This work would serve as a guidance for further experimentation and engineering with advanced semiconducting materials in electronic device applications.