Advanced Deposition Techniques, 2013
Author | : |
Publisher | : |
Total Pages | : 156 |
Release | : 2013 |
Genre | : Depositions |
ISBN | : 9781402419256 |
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Author | : |
Publisher | : |
Total Pages | : 156 |
Release | : 2013 |
Genre | : Depositions |
ISBN | : 9781402419256 |
Author | : Amanda Alexandra Volk |
Publisher | : |
Total Pages | : 0 |
Release | : 2023 |
Genre | : |
ISBN | : |
Author | : Asim Jilani |
Publisher | : |
Total Pages | : |
Release | : 2017 |
Genre | : Science |
ISBN | : |
Thin films have a great impact on the modern era of technology. Thin films are considered as backbone for advanced applications in the various fields such as optical devices, environmental applications, telecommunications devices, energy storage devices, and so on . The crucial issue for all applications of thin films depends on their morphology and the stability. The morphology of the thin films strongly hinges on deposition techniques. Thin films can be deposited by the physical and chemical routes. In this chapter, we discuss some advance techniques and principles of thin-film depositions. The vacuum thermal evaporation technique, electron beam evaporation, pulsed-layer deposition, direct current/radio frequency magnetron sputtering, and chemical route deposition systems will be discussed in detail.
Author | : |
Publisher | : ScholarlyEditions |
Total Pages | : 988 |
Release | : 2013-06-21 |
Genre | : Medical |
ISBN | : 1481674293 |
Chemical Processes—Advances in Research and Application: 2013 Edition is a ScholarlyBrief™ that delivers timely, authoritative, comprehensive, and specialized information about ZZZAdditional Research in a concise format. The editors have built Chemical Processes—Advances in Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about ZZZAdditional Research in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Chemical Processes—Advances in Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author | : Rointan Framroze Bunshah |
Publisher | : William Andrew |
Total Pages | : 888 |
Release | : 1994 |
Genre | : Science |
ISBN | : 0815513372 |
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author | : Peter M. Martin |
Publisher | : William Andrew |
Total Pages | : 932 |
Release | : 2009-12-01 |
Genre | : Technology & Engineering |
ISBN | : 0815520328 |
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author | : Krishna Seshan |
Publisher | : CRC Press |
Total Pages | : 72 |
Release | : 2002-02-01 |
Genre | : Science |
ISBN | : 1482269686 |
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Author | : Phillip H. Miller |
Publisher | : |
Total Pages | : 347 |
Release | : 2013-01-01 |
Genre | : Depositions |
ISBN | : 9781934833827 |
Author | : Dang Cai |
Publisher | : |
Total Pages | : 273 |
Release | : 2006 |
Genre | : Chemical vapor deposition |
ISBN | : 9781109966763 |
Thermal Activated Chemical Vapor Deposition (TACVD) is defined as the formation of a stable solid product on a heated substrate surface from chemical reactions and/or dissociation of gaseous reactants in an activated environment. It has become an essential process for producing solid film, bulk material, coating, fibers, powders and monolithic components. Global market of CVD products has reached multi billions dollars for each year.
Author | : Xiu-Tian Yan |
Publisher | : Springer Science & Business Media |
Total Pages | : 352 |
Release | : 2010-03-23 |
Genre | : Technology & Engineering |
ISBN | : 1848828942 |
"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.