Advanced Deposition Techniques, 2011
Author | : |
Publisher | : |
Total Pages | : 109 |
Release | : 2011 |
Genre | : Depositions |
ISBN | : 9781402415180 |
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Author | : |
Publisher | : |
Total Pages | : 109 |
Release | : 2011 |
Genre | : Depositions |
ISBN | : 9781402415180 |
Author | : Amanda Alexandra Volk |
Publisher | : |
Total Pages | : 0 |
Release | : 2023 |
Genre | : |
ISBN | : |
Author | : Asim Jilani |
Publisher | : |
Total Pages | : |
Release | : 2017 |
Genre | : Science |
ISBN | : |
Thin films have a great impact on the modern era of technology. Thin films are considered as backbone for advanced applications in the various fields such as optical devices, environmental applications, telecommunications devices, energy storage devices, and so on . The crucial issue for all applications of thin films depends on their morphology and the stability. The morphology of the thin films strongly hinges on deposition techniques. Thin films can be deposited by the physical and chemical routes. In this chapter, we discuss some advance techniques and principles of thin-film depositions. The vacuum thermal evaporation technique, electron beam evaporation, pulsed-layer deposition, direct current/radio frequency magnetron sputtering, and chemical route deposition systems will be discussed in detail.
Author | : Peter M. Martin |
Publisher | : William Andrew |
Total Pages | : 932 |
Release | : 2009-12-01 |
Genre | : Technology & Engineering |
ISBN | : 0815520328 |
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author | : Rointan Framroze Bunshah |
Publisher | : William Andrew |
Total Pages | : 888 |
Release | : 1994 |
Genre | : Science |
ISBN | : 0815513372 |
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author | : Krishna Seshan |
Publisher | : CRC Press |
Total Pages | : 72 |
Release | : 2002-02-01 |
Genre | : Science |
ISBN | : 1482269686 |
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Author | : Krishna Seshan |
Publisher | : William Andrew |
Total Pages | : 430 |
Release | : 2001-02-01 |
Genre | : Technology & Engineering |
ISBN | : 0815517785 |
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author | : Yuan Lin |
Publisher | : John Wiley & Sons |
Total Pages | : 328 |
Release | : 2016-08-29 |
Genre | : Technology & Engineering |
ISBN | : 3527696458 |
This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
Author | : Krishna Seshan |
Publisher | : William Andrew |
Total Pages | : 412 |
Release | : 2012-06-27 |
Genre | : Science |
ISBN | : 1437778739 |
Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author | : Abdel Salam Hamdy Makhlouf |
Publisher | : Elsevier |
Total Pages | : 449 |
Release | : 2011-09-14 |
Genre | : Science |
ISBN | : 0857094904 |
Coatings are used for a wide range of applications, from anti-fogging coatings for glass through to corrosion control in the aerospace and automotive industries. Nanocoatings and ultra-thin films provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings. Part one covers technologies used in the creation and analysis of thin films, including chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films. Part two focuses on the applications of nanocoatings and ultra-thin films, with chapters covering topics such as nanocoatings for architectural glass, packaging applications, conventional and smart nanocoatings for corrosion protection in aerospace engineering and ultra-thin membranes for sensor applications. With its distinguished editors and international team of contributors, Nanocoatings and ultra-thin films is an essential reference for professional engineers in the glazing, consctruction, electronics and transport industries, as well as all those with an academic research interest in the field. Provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings Focuses on the applications of nanocoatings and ultra-thin films, covering topics such as nanocoatings for architectural glass, packaging applications and ultra-thin membranes for sensor applications Includes chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films