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Adhesion in Microelectronics

Adhesion in Microelectronics
Author: K. L. Mittal
Publisher: John Wiley & Sons
Total Pages: 293
Release: 2014-08-25
Genre: Technology & Engineering
ISBN: 1118831349

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This comprehensive book will provide both fundamental and applied aspects of adhesion pertaining to microelectronics in a single and easily accessible source. Among the topics to be covered include; Various theories or mechanisms of adhesion Surface (physical or chemical) characterization of materials as it pertains to adhesion Surface cleaning as it pertains to adhesion Ways to improve adhesion Unraveling of interfacial interactions using an array of pertinent techniques Characterization of interfaces / interphases Polymer-polymer adhesion Metal-polymer adhesion (metallized polymers) Polymer adhesion to various substrates Adhesion of thin films Adhesion of underfills Adhesion of molding compounds Adhesion of different dielectric materials Delamination and reliability issues in packaged devices Interface mechanics and crack propagation Adhesion measurement of thin films and coatings


Adhesives Technology for Electronic Applications

Adhesives Technology for Electronic Applications
Author: James J. Licari
Publisher: William Andrew
Total Pages: 415
Release: 2011-06-24
Genre: Technology & Engineering
ISBN: 1437778909

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Approx.512 pages Approx.512 pages


Ire Bonding in Microelectronics

Ire Bonding in Microelectronics
Author: George G. Harman
Publisher: McGraw Hill Professional
Total Pages: 290
Release: 1997
Genre: Technology & Engineering
ISBN: 9780070326194

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The first edition of this work is considered a classic reference in the field. This new edition updates the entire work and adds 100 pages of information covering new materials and techniques such as fine pitch


Interfacial Compatibility in Microelectronics

Interfacial Compatibility in Microelectronics
Author: Tomi Laurila
Publisher: Springer Science & Business Media
Total Pages: 221
Release: 2012-01-10
Genre: Technology & Engineering
ISBN: 1447124707

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Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced. In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes: solutions to several common reliability issues in microsystem technology, methods to understand and predict failure mechanisms at interfaces between dissimilar materials and an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA. Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.


Microelectronic Ultrasonic Bonding

Microelectronic Ultrasonic Bonding
Author: George G. Harman
Publisher:
Total Pages: 116
Release: 1974
Genre: Microelectronics
ISBN:

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Semiconductor Wafer Bonding 9: Science, Technology, and Applications

Semiconductor Wafer Bonding 9: Science, Technology, and Applications
Author: Helmut Baumgart
Publisher: The Electrochemical Society
Total Pages: 398
Release: 2006
Genre: Microelectromechanical systems
ISBN: 156677506X

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This issue of ECS Transactions covers state-of-the-art R&D results of the last 1.5 years in the field of semiconductor wafer bonding technology. Wafer Bonding Technology can be used to create novel composite materials systems and devices what would otherwise be unattainable. Wafer bonding today is rapidly expanding applications in such diverse fields as photonics, sensors, MEMS, X-ray optics, non-electronic microstructures, high performance CMOS platforms for high end servers, Si-Ge, strained SOI, Germanium-on-Insulator (GeOI), and Nanotechnologies.